Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4942108 | Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Wayne M. Moreau, Kaolin N. Chiong, Nancy Snyder | 1990-07-17 |
| 4939070 | Thermally stable photoresists with high sensitivity | William R. Brunsvold, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet, George J. Hefferon +3 more | 1990-07-03 |
| 4810601 | Top imaged resists | Robert David Allen, Kaolin N. Chiong, Scott A. MacDonald, Jer-Ming Yang, Carlton G. Willson | 1989-03-07 |
| 4702792 | Method of forming fine conductive lines, patterns and connectors | William L. Guthrie, Frank B. Kaufman | 1987-10-27 |
| 4474864 | Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist | Alexander D. Lopata, Christopher F. Lyons, Robert C. McIntosh, Anthony F. Scaduto | 1984-10-02 |
| 4464458 | Process for forming resist masks utilizing O-quinone diazide and pyrene | Edward C. Fredericks, Wayne M. Moreau | 1984-08-07 |