| 4942108 |
Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers |
Wayne M. Moreau, Kaolin N. Chiong, Nancy Snyder |
1990-07-17 |
| 4939070 |
Thermally stable photoresists with high sensitivity |
William R. Brunsvold, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet, George J. Hefferon +3 more |
1990-07-03 |
| 4810601 |
Top imaged resists |
Robert David Allen, Kaolin N. Chiong, Scott A. MacDonald, Jer-Ming Yang, Carlton G. Willson |
1989-03-07 |
| 4702792 |
Method of forming fine conductive lines, patterns and connectors |
William L. Guthrie, Frank B. Kaufman |
1987-10-27 |
| 4474864 |
Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist |
Alexander D. Lopata, Christopher F. Lyons, Robert C. McIntosh, Anthony F. Scaduto |
1984-10-02 |
| 4464458 |
Process for forming resist masks utilizing O-quinone diazide and pyrene |
Edward C. Fredericks, Wayne M. Moreau |
1984-08-07 |
