Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4980264 | Photoresist compositions of controlled dissolution rate in alkaline developers | Bea-Jane L. Yang, Jer-Ming Yang | 1990-12-25 |
| 4942108 | Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Wayne M. Moreau, Ming-Fea Chow, Nancy Snyder | 1990-07-17 |
| 4904564 | Process for imaging multi-layer resist structure | — | 1990-02-27 |
| 4880722 | Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Wayne M. Moreau | 1989-11-14 |
| 4810601 | Top imaged resists | Robert David Allen, Ming-Fea Chow, Scott A. MacDonald, Jer-Ming Yang, Carlton G. Willson | 1989-03-07 |
| 4613398 | Formation of etch-resistant resists through preferential permeation | Bea-Jane L. Yang, Jer-Ming Yang | 1986-09-23 |