Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4980264 | Photoresist compositions of controlled dissolution rate in alkaline developers | Kaolin N. Chiong, Jer-Ming Yang | 1990-12-25 |
| 4737425 | Patterned resist and process | Burn Jeng Lin, Jer-Mind Yang | 1988-04-12 |
| 4613398 | Formation of etch-resistant resists through preferential permeation | Kaolin N. Chiong, Jer-Ming Yang | 1986-09-23 |