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Systems and methods for generating hint information associated with a host command |
Judah Gamliel Hahn, Joseph Meza |
2018-10-16 |
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Data integrity enhancement to protect against returning old versions of data |
Girish Desai |
2017-11-21 |
| 9817752 |
Data integrity enhancement to protect against returning old versions of data |
Girish Desai |
2017-11-14 |
| 8949491 |
Buffer memory reservation techniques for use with a NAND flash memory |
Gary Lin, Robert Jackson, Yoav Weinberg, Girish Desai |
2015-02-03 |
| 8364992 |
Method and system for reducing power consumption by command selection in a hard disk drive |
Nyles Heise, Hung M. Vu |
2013-01-29 |
| 7255629 |
Polishing assembly with a window |
Manoocher Birang, Allan Gleason |
2007-08-14 |
| 7118450 |
Polishing pad with window and method of fabricating a window in a polishing pad |
Manoocher Birang, Allan Gleason |
2006-10-10 |
| 7011565 |
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
Manoocher Birang, Allan Gleason |
2006-03-14 |
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Method of forming a transparent window in a polishing pad |
Manoocher Birang, Allan Gleason |
2005-06-28 |
| 6632377 |
Chemical-mechanical planarization of metallurgy |
Vlasta Brusic, Daniel C. Edelstein, Paul M. Feeney, Mark A. Jaso, Frank B. Kaufman +4 more |
2003-10-14 |
| 6280290 |
Method of forming a transparent window in a polishing pad |
Manoocher Birang, Allan Gleason |
2001-08-28 |
| 6280297 |
Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
Robert D. Tolles, Jeffrey Marks, Tsungnan Cheng |
2001-08-28 |
| 6131271 |
Method of planarizing first pole piece layer of write head by lapping without delamination of first pole piece layer from wafer substrate |
Robert E. Fontana, Jr., Hung-Chin Guthrie, Eric James Lee, Li-Chung Lee, Francisco Martin |
2000-10-17 |
| 6051499 |
Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
Robert D. Tolles, Jeffrey Marks, Tsungnan Cheng, Semyon Spektor, Ivan A. Ocanada +1 more |
2000-04-18 |
| 6045439 |
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
Manoocher Birang, Allan Gleason |
2000-04-04 |
| 6020264 |
Method and apparatus for in-line oxide thickness determination in chemical-mechanical polishing |
Naftali E. Lustig, Thomas E. Sandwick |
2000-02-01 |
| 5893796 |
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
Manoocher Birang, Allan Gleason |
1999-04-13 |
| 5795215 |
Method and apparatus for using a retaining ring to control the edge effect |
Tsungnan Cheng, Sen-Hou Ko, Harry Q. Lee, Michael Sherwood, Norm Shendon |
1998-08-18 |
| 5709593 |
Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
Semyon Spektor, Ivan A. Ocanada, Norm Shendon |
1998-01-20 |
| 5633195 |
Laser planarization of zone 1 deposited metal films for submicron metal interconnects |
Naftali E. Lustig |
1997-05-27 |
| 5337015 |
In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage |
Naftali E. Lustig, Randall M. Feenstra |
1994-08-09 |
| 4954142 |
Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor |
Jeffrey Carr, Lawrence D. David, Frank B. Kaufman, William J. Patrick, Kenneth P. Rodbell +2 more |
1990-09-04 |
| 4944836 |
Chem-mech polishing method for producing coplanar metal/insulator films on a substrate |
Klaus D. Beyer, Stanley R. Makarewicz, Eric Mendel, William J. Patrick, Kathleen Anne Perry +4 more |
1990-07-31 |
| 4789648 |
Method for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud vias |
Melanie M. Chow, John Cronin, Carter W. Kaanta, Barbara Luther, William J. Patrick +2 more |
1988-12-06 |
| 4702792 |
Method of forming fine conductive lines, patterns and connectors |
Ming-Fea Chow, Frank B. Kaufman |
1987-10-27 |