Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7598169 | Method to remove beol sacrificial materials and chemical residues by irradiation | Qinghuang Lin, Elbert E. Huang, Christy S. Tyberg | 2009-10-06 |
| 7514361 | Selective thin metal cap process | Griselda Bonilla, Shyng-Tsong Chen, Matthew E. Colburn, Chih-Chao Yang | 2009-04-07 |
| 7253100 | Reducing damage to ulk dielectric during cross-linked polymer removal | Daniel C. Edelstein, Habib Hichri, Vincent J. McGahay | 2007-08-07 |
| 7214603 | Method for fabricating interconnect structures with reduced plasma damage | Elbert E. Huang, Qinghuang Lin, Robert D. Miller | 2007-05-08 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations | Kuang-Jung Chen, Hiroshi Ito, George M. Jordhamo, Ahmad D. Katnani | 2002-04-02 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Kuang-Jung Chen, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2001-10-16 |
| 6268436 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Quighuang Lin | 2001-07-31 |
| 6207353 | Resist formulation which minimizes blistering during etching | Michael D. Armacost, Willard E. Conley, Tina J. Cotler-Wagner, David M. Dobuzinsky, Michael L. Passow +1 more | 2001-03-27 |
| 6203965 | Photoresist comprising blends of photoacid generators | James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray, Wu-Song Huang +3 more | 2001-03-20 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh, Qinghuang Lin | 2000-08-15 |
| 6074800 | Photo acid generator compounds, photo resists, and method for improving bias | Gregory Breyta, Phillip Brock, Daniel J. Dawson, Charlotte R. DeWan, Andrew Robert Eckert +6 more | 2000-06-13 |
| 6042997 | Copolymers and photoresist compositions comprising copolymer resin binder component | George G. Barclay, Michael F. Cronin, James W. Thackeray, Hiroshi Ito, Greg Breyta | 2000-03-28 |
| 5861231 | Copolymers and photoresist compositions comprising copolymer resin binder component | George G. Barclay, Michael F. Cronin, James W. Thackeray, Hiroshi Ito, Greg Breyta | 1999-01-19 |
| 5264328 | Resist development endpoint detection for X-ray lithography | John L. Mauer, IV, David E. Seeger | 1993-11-23 |