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Home › Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane

Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane

US Patent 5399462 · Granted Mar 21, 1995

Estimated economic value: $19,868,000 ⓘ

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