Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

US Patent 6979518 · Granted Dec 27, 2005

Estimated economic value: $5,960,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-laye2025
Tin oxide thin film spacers in semiconductor device manufacturing2024
Chamfer-less via integration scheme2024
Selective deposition of etch-stop layer for enhanced patterning2024
Tin oxide thin film spacers in semiconductor device manufacturing2023
Graphical user interface based feature extraction application for machine learni2022
Tin oxide thin film spacers in semiconductor device manufacturing2021
Extraction of information and smart annotation of relevant information within co2021
Extraction of information and smart annotation of relevant information within co2021
Personalized intervention based on machine learning of behavior change states2021
Selective deposition of etch-stop layer for enhanced patterning2021
Lateral heterojunction bipolar transistors with asymmetric junctions2021