Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide thin film spacers in semiconductor device manufacturing

US Patent 11784047 · Granted Oct 10, 2023

Estimated economic value: $246,209,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integration of dry development and etch processes for EUV patterning in a single2025
Modulated atomic layer deposition2025
Tin oxide films in semiconductor device manufacturing2025
Tin oxide films in semiconductor device manufacturing2025
Reducing intralevel capacitance in semiconductor devices2025
Impurity reduction in silicon-containing films2025
Plasma-enhanced deposition of film stacks2025
In situ protective coating of chamber components for semiconductor processing2025
Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-laye2025
Deposition of films using molybdenum precursors2025
Low stress films for advanced semiconductor applications2025
Systems and methods for homogenous intermixing of precursors in alloy atomic lay2025