| 6296989 |
Silylation of epoxy-containing photoresist films |
Evangelos Gogolides, Evangelia Tegou, Panagiotis Argitis |
2001-10-02 |
| 6097019 |
Radiation control system |
David Lewis, Jane M. Shaw |
2000-08-01 |
| 5837978 |
Radiation control system |
David Lewis, Jane M. Shaw |
1998-11-17 |
| 5565529 |
Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability |
Edward D. Babich, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw |
1996-10-15 |
| 5340914 |
Microwave processing |
Jerome J. Cuomo, Jeffrey D. Gelorme, David Lewis, Jane M. Shaw, Stanley Joseph Whitehair |
1994-08-23 |
| 5241040 |
Microwave processing |
Jerome J. Cuomo, Jeffrey D. Gelorme, David Lewis, Jane M. Shaw, Stanley Joseph Whitehair |
1993-08-31 |
| 5238773 |
Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups |
Edward D. Babich, Donis Flagello, Jurij R. Paraszczak, Jane M. Shaw, David F. Witman |
1993-08-24 |
| 5171992 |
Nanometer scale probe for an atomic force microscope, and method for making same |
Joachim Clabes, Kam-Leung Lee, Bojan Petek, John Casimir Slonczewski |
1992-12-15 |
| 5141817 |
Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability |
Edward D. Babich, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw |
1992-08-25 |
| 5115095 |
Epoxy functional organosilicon polymer |
Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-05-19 |
| 5110711 |
Method for forming a pattern |
Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-05-05 |
| 5098816 |
Method for forming a pattern of a photoresist |
Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-03-24 |
| 5059512 |
Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1991-10-22 |
| 5041358 |
Negative photoresist and use thereof |
Jane M. Shaw, Kevin J. Stewart |
1991-08-20 |
| 4981909 |
Plasma-resistant polymeric material, preparation thereof, and use thereof |
Edward D. Babich, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman |
1991-01-01 |
| 4782008 |
Plasma-resistant polymeric material, preparation thereof, and use thereof |
Edward D. Babich, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman |
1988-11-01 |
| 4693960 |
Photolithographic etching process using organosilicon polymer composition |
Edward D. Babich, John J. Liutkis, Juri R. Parasczak, Jane M. Shaw |
1987-09-15 |
| 4678850 |
Halogenated polystyrenes for electron beam, X-ray and photo resists |
John J. Liutkus, Jurij R. Paraszcszak, Jane M. Shaw |
1987-07-07 |
| 4603195 |
Organosilicon compound and use thereof in photolithography |
Edward D. Babich, Jurij R. Paraszczak, Jane M. Shaw |
1986-07-29 |
| 4581100 |
Mixed excitation plasma etching system |
Juri R. Paraszczak, Bennett Robinson |
1986-04-08 |
| 4379833 |
Self-aligned photoresist process |
Benjamin J. Canavello |
1983-04-12 |
| 4259369 |
Image hardening process |
Benjamin J. Canavello |
1981-03-31 |
| 4212935 |
Method of modifying the development profile of photoresists |
Benjamin J. Canavello, Jane M. Shaw |
1980-07-15 |
