Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6296989 | Silylation of epoxy-containing photoresist films | Evangelos Gogolides, Evangelia Tegou, Panagiotis Argitis | 2001-10-02 |
| 6097019 | Radiation control system | David Lewis, Jane M. Shaw | 2000-08-01 |
| 5837978 | Radiation control system | David Lewis, Jane M. Shaw | 1998-11-17 |
| 5565529 | Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability | Edward D. Babich, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw | 1996-10-15 |
| 5340914 | Microwave processing | Jerome J. Cuomo, Jeffrey D. Gelorme, David Lewis, Jane M. Shaw, Stanley Joseph Whitehair | 1994-08-23 |
| 5241040 | Microwave processing | Jerome J. Cuomo, Jeffrey D. Gelorme, David Lewis, Jane M. Shaw, Stanley Joseph Whitehair | 1993-08-31 |
| 5238773 | Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups | Edward D. Babich, Donis Flagello, Jurij R. Paraszczak, Jane M. Shaw, David F. Witman | 1993-08-24 |
| 5171992 | Nanometer scale probe for an atomic force microscope, and method for making same | Joachim Clabes, Kam-Leung Lee, Bojan Petek, John Casimir Slonczewski | 1992-12-15 |
| 5141817 | Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability | Edward D. Babich, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw | 1992-08-25 |
| 5115095 | Epoxy functional organosilicon polymer | Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-05-19 |
| 5110711 | Method for forming a pattern | Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-05-05 |
| 5098816 | Method for forming a pattern of a photoresist | Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-03-24 |
| 5059512 | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions | Edward D. Babich, Jeffrey D. Gelorme, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1991-10-22 |
| 5041358 | Negative photoresist and use thereof | Jane M. Shaw, Kevin J. Stewart | 1991-08-20 |
| 4981909 | Plasma-resistant polymeric material, preparation thereof, and use thereof | Edward D. Babich, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman | 1991-01-01 |
| 4782008 | Plasma-resistant polymeric material, preparation thereof, and use thereof | Edward D. Babich, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman | 1988-11-01 |
| 4693960 | Photolithographic etching process using organosilicon polymer composition | Edward D. Babich, John J. Liutkis, Juri R. Parasczak, Jane M. Shaw | 1987-09-15 |
| 4678850 | Halogenated polystyrenes for electron beam, X-ray and photo resists | John J. Liutkus, Jurij R. Paraszcszak, Jane M. Shaw | 1987-07-07 |
| 4603195 | Organosilicon compound and use thereof in photolithography | Edward D. Babich, Jurij R. Paraszczak, Jane M. Shaw | 1986-07-29 |
| 4581100 | Mixed excitation plasma etching system | Juri R. Paraszczak, Bennett Robinson | 1986-04-08 |
| 4379833 | Self-aligned photoresist process | Benjamin J. Canavello | 1983-04-12 |
| 4259369 | Image hardening process | Benjamin J. Canavello | 1981-03-31 |
| 4212935 | Method of modifying the development profile of photoresists | Benjamin J. Canavello, Jane M. Shaw | 1980-07-15 |