Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Forming a pattern of a negative photoresist

Forming a pattern of a negative photoresist

US Patent 6617086 · Granted Sep 9, 2003

Estimated economic value: $18,984,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reducing line edge roughness and mitigating defects by wafer freezing2024
Spin on scaffold film for forming topvia2023
Graphical user interface based feature extraction application for machine learni2022
Extraction of information and smart annotation of relevant information within co2021
Extraction of information and smart annotation of relevant information within co2021
Personalized intervention based on machine learning of behavior change states2021
Lateral heterojunction bipolar transistors with asymmetric junctions2021
Dynamic adjustment of post exposure bake during lithography utilizing real-time 2021
Photoresist bridging defect removal by reverse tone weak developer2021
Photoresist bridging defect removal by reverse tone weak developer2021
Self-aligned single diffusion break for fully depleted silicon-on-insulator and 2020
Dynamic adjustment of post exposure bake during lithography utilizing real-time 2020