| 12488994 |
Magnesium oxide based hardmask for reactive ion etching |
Aakash Pushp, M A Mueed, Benjamin Madon, Noel Arellano, Krystelle Lionti +3 more |
2025-12-02 |
|
| 10957953 |
Lithium oxygen battery and electrolyte composition |
Seok Ju Kang, Bryan D. McCloskey, Takashi Mori, Satoru Narizuka |
2021-03-23 |
$2,115,000 |
| 9772558 |
Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists |
Ramakrishnan Ayothi, Sally A. Swanson |
2017-09-26 |
$3,108,000 |
| 9666918 |
Lithium oxygen battery and electrolyte composition |
Seok Ju Kang, Bryan D. McCloskey, Takashi Mori, Satoru Narizuka |
2017-05-30 |
$1,983,000 |
| 9450278 |
Cathode material for lithium—oxygen battery |
Ho-Cheol Kim, Bryan D. McCloskey, Rouven Scheffler, Angela Speidel, Sally A. Swanson |
2016-09-20 |
$4,565,000 |
| 9057960 |
Resist performance for the negative tone develop organic development process |
Luisa D. Bozano, Dario L. Goldfarb, Linda Karin Sundberg, Hoa D. Truong, HsinYu Tsai |
2015-06-16 |
$2,098,000 |
| 8945808 |
Self-topcoating resist for photolithography |
Robert Allen David, Phillip Brock, Carl E. Larson, Daniel P. Sanders, Ratnam Sooriyakumaran +2 more |
2015-02-03 |
$3,062,000 |
| 8900802 |
Positive tone organic solvent developed chemically amplified resist |
Robert David Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda Karin Sundberg +2 more |
2014-12-02 |
$2,384,000 |
| 8821978 |
Methods of directed self-assembly and layered structures formed therefrom |
Joy Cheng, William D. Hinsberg, Hiroshi Ito, Ho-Cheol Kim, Young-Hye Na +3 more |
2014-09-02 |
$3,373,000 |
| 8703386 |
Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications |
John David Bass, Ho-Cheol Kim, Robert D. Miller, Qing Song, Linda Karin Sundberg |
2014-04-22 |
$7,961,000 |
| 8614047 |
Photodecomposable bases and photoresist compositions |
Ramakrishnan Ayothi, William D. Hinsberg, Sally A. Swanson |
2013-12-24 |
$7,453,000 |
| 8298751 |
Alkaline rinse agents for use in lithographic patterning |
William D. Hinsberg |
2012-10-30 |
|
| 7951524 |
Self-topcoating photoresist for photolithography |
Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more |
2011-05-31 |
$4,283,000 |
| 7875408 |
Bleachable materials for lithography |
John A. Hoffnagle, David R. Medeiros, Robert D. Miller, Libor Vycklicky |
2011-01-25 |
$4,442,000 |
| 7855045 |
Immersion topcoat materials with improved performance |
Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more |
2010-12-21 |
$6,138,000 |
| 7820369 |
Method for patterning a low activation energy photoresist |
Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran +1 more |
2010-10-26 |
$4,266,000 |
| 7807340 |
Photoresists for visible light imaging |
Gregory Breyta, Daniel J. Dawson, Carl E. Larson |
2010-10-05 |
$4,341,000 |
| 7767385 |
Method for lithography for optimizing process conditions |
Carl E. Larson, Sharee McNab, Steven E. Steen, Raman Viswanathan |
2010-08-03 |
$4,325,000 |
| 7651872 |
Discrete nano-textured structures in biomolecular arrays, and method of use |
Mark Whitney Hart, Ho-Cheol Kim, Robert D. Miller |
2010-01-26 |
$13,842,000 |
| 7585609 |
Bilayer film including an underlayer having vertical acid transport properties |
Carl E. Larson |
2009-09-08 |
$16,659,000 |
| 7354777 |
Discrete nano-textured structures in biomolecular arrays, and method of use |
Mark Whitney Hart, Ho-Cheol Kim, Robert D. Miller |
2008-04-08 |
$6,866,000 |
| 7354692 |
Photoresists for visible light imaging |
Gregory Breyta, Daniel J. Dawson, Carl E. Larson |
2008-04-08 |
$6,866,000 |
| 7300741 |
Advanced chemically amplified resist for sub 30 nm dense feature resolution |
Wu-Song Huang, David R. Medeiros |
2007-11-27 |
$7,635,000 |
| 7288362 |
Immersion topcoat materials with improved performance |
Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more |
2007-10-30 |
$4,304,000 |
| 7193023 |
Low activation energy photoresists |
Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran +1 more |
2007-03-20 |
$5,658,000 |
