Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7135595 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-11-14 |
| 7090963 | Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging | David R. Medeiros, Wu-Song Huang, Bill Hinsberg, Frances Anne Houle | 2006-08-15 |
| 7056840 | Direct photo-patterning of nanoporous organosilicates, and method of use | Robert D. Miller, Ho-Cheol Kim, Eric J. Connor, Victor Yee-Way Lee, Willi Volksen | 2006-06-06 |
| 7014980 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-03-21 |
| 6962822 | Discrete nano-textured structures in biomolecular arrays, and method of use | Mark Whitney Hart, Ho-Cheol Kim, Robert D. Miller | 2005-11-08 |
| 6806026 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2004-10-19 |
| 6730452 | Lithographic photoresist composition and process for its use | Phillip Brock, Daniel J. Dawson, Hiroshi Ito | 2004-05-04 |
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran | 2003-11-25 |
| RE38282 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Ratnam Sooriyakumaran | 2003-10-21 |
| 6627111 | Organic light emitting displays and new fluorescent compounds | Sally A. Swanson | 2003-09-30 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | Robert David Allen, Phillip Brock, Hiroshi Ito | 2003-08-26 |
| 6548219 | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions | Hiroshi Ito, Phillip Brock | 2003-04-15 |
| 6509134 | Norbornene fluoroacrylate copolymers and process for the use thereof | Hiroshi Ito, Dolores Carlotta Miller, Phillip Brock | 2003-01-21 |
| 6482566 | Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography | Donald C. Hofer, Scott A. MacDonald, Arpan Mahorowala, Robert D. Miller, Josef Michl | 2002-11-19 |
| 6444408 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran | 2002-09-03 |
| 6180317 | Composition for photoimaging | Robert David Allen, Richard A. Day, Donald Herman Glatzel, William D. Hinsberg, John R. Mertz +1 more | 2001-01-30 |
| 6177228 | Photoresist composition and process for its use | Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas I. Wallow | 2001-01-23 |
| 6165678 | Lithographic photoresist composition and process for its use in the manufacture of integrated circuits | Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas I. Wallow | 2000-12-26 |
| 5985524 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Ratnam Sooriyakumaran | 1999-11-16 |
| 5866306 | Process for use of photosensitive polysilanes as photoresist | Robert D. Miller, Mark Edwin Baier | 1999-02-02 |
| 5786131 | Process for use of photoresist composition with deep ultraviolet radiation | Robert David Allen, Richard Anthony DiPietro | 1998-07-28 |
| 5747223 | Composition for photoimaging | Robert David Allen, Richard A. Day, Donald Herman Glatzel, William D. Hinsberg, John R. Mertz +1 more | 1998-05-05 |
| 5665527 | Process for generating negative tone resist images utilizing carbon dioxide critical fluid | Robert David Allen | 1997-09-09 |
| 5658734 | Process for synthesizing chemical compounds | Phillip Brock, William D. Hinsberg, Jeffrey W. Labadie, Glenn McGall | 1997-08-19 |
| 5580694 | Photoresist composition with androstane and process for its use | Robert David Allen, Richard Anthony DiPietro | 1996-12-03 |