| 8900802 |
Positive tone organic solvent developed chemically amplified resist |
Robert David Allen, Ramakrishnan Ayothi, Luisa D. Bozano, Linda Karin Sundberg, Sally A. Swanson +2 more |
2014-12-02 |
| 8614047 |
Photodecomposable bases and photoresist compositions |
Ramakrishnan Ayothi, Sally A. Swanson, Gregory Michael Wallraff |
2013-12-24 |
| 7855045 |
Immersion topcoat materials with improved performance |
Robert David Allen, Phillip Brock, Dario Gil, Carl E. Larson, Linda Karin Sundberg +1 more |
2010-12-21 |
| 7288362 |
Immersion topcoat materials with improved performance |
Robert David Allen, Phillip Brock, Dario Gil, Carl E. Larson, Linda Karin Sundberg +1 more |
2007-10-30 |
| 6180317 |
Composition for photoimaging |
Robert David Allen, Richard A. Day, Donald Herman Glatzel, John R. Mertz, David J. Russell +1 more |
2001-01-30 |
| 5807947 |
Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene |
Richard Vicari, Douglas J. Gordon, Dennis McKean, Carlton G. Willson, Ralph R. Dammel |
1998-09-15 |
| 5747223 |
Composition for photoimaging |
Robert David Allen, Richard A. Day, Donald Herman Glatzel, John R. Mertz, David J. Russell +1 more |
1998-05-05 |
| 5342727 |
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition |
Richard Vicari, Douglas J. Gordon, Dennis McKean, Carlton G. Willson, Ralph R. Dammel |
1994-08-30 |
| 5264325 |
Composition for photo imaging |
Robert David Allen, Richard A. Day, Donald Herman Glatzel, John R. Mertz, David J. Russell +1 more |
1993-11-23 |
| 5055439 |
Photoacid generating composition and sensitizer therefor |
Robert David Allen, Logan L. Simpson, Robert J. Twieg, Gregory Michael Wallraff, Carlton G. Willson |
1991-10-08 |
