LS

Logan L. Simpson

IBM: 12 patents #9,222 of 70,183Top 15%
Canon: 7 patents #7,830 of 19,416Top 45%
MI Molecular Imprints: 1 patents #71 of 97Top 75%
Overall (All Time): #213,950 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12235587 Method and system for determining initial contact control values for shaping partial fields and method and system for shaping partial fields Daniel Ironside 2025-02-25
11927883 Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers Steven Wayne Burns, Matthew C. Traub, Adam Shackleton, Whitney Longsine, Brent Snyder 2024-03-12
11762295 Fluid droplet methodology and apparatus for imprint lithography Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher, James W. Irving 2023-09-19
11614693 Method of determining the initial contact point for partial fields and method of shaping a surface Xiaoming Lu, Mario Johannes Meissl 2023-03-28
11215921 Residual layer thickness compensation in nano-fabrication by modified drop pattern Ecron D. Thompson, Craig William Cone, Wei Zhang, James W. Irving 2022-01-04
11209730 Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone +2 more 2021-12-28
11040366 Dispenser shield with adjustable aperture to improve drop placement and residual layer thickness Seth J. Bamesberger, John Williamson 2021-06-22
8480933 Fluid dispense device calibration Van Nguyen Truskett, Stephen C. Johnson, Niyaz Khusnatdinov 2013-07-09
6194785 Method for circuitizing through-holes by photo-activated seeding Cindy Reidsema Simpson, Joseph E. Varsik 2001-02-27
6087258 Method for circuitizing through-holes by photo-activated seeding Cindy Reidsema Simpson, Joseph E. Varsik 2000-07-11
5498765 Positive photoresist composition containing photoacid generator and use thereof Burton J. Carpenter, Michael G. McMaster, Joseph LaTorre 1996-03-12
5439766 Composition for photo imaging Richard A. Day, Donald Herman Glatzel, John R. Mertz, Joel L. Roth, David J. Russell 1995-08-08
5374500 Positive photoresist composition containing photoacid generator and use thereof Burton J. Carpenter, Michael G. McMaster, Joseph LaTorre 1994-12-20
5272042 Positive photoresist system for near-UV to visible imaging Robert David Allen, William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre +5 more 1993-12-21
5266444 Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition Burton J. Carpenter, Joseph LaTorre, Michael G. McMaster 1993-11-30
5102772 Photocurable epoxy composition with sulfonium salt photoinitiator Raymond W. Angelo, Jeffrey D. Gelorme, Joseph Kuczynski, William H. Lawrence, Socrates Pappas 1992-04-07
5071730 Liquid apply, aqueous processable photoresist compositions Robert David Allen, William D. Hinsberg, Gregory Michael Wallraff 1991-12-10
5055439 Photoacid generating composition and sensitizer therefor Robert David Allen, William D. Hinsberg, Robert J. Twieg, Gregory Michael Wallraff, Carlton G. Willson 1991-10-08
5047568 Sulfonium salts and use and preparation thereof Raymond W. Angelo, Jeffrey D. Gelorme, Joseph Kuczynski, William H. Lawrence, Socrates Pappas 1991-09-10
5045431 Dry film, aqueous processable photoresist compositions Robert David Allen, Gregory Michael Wallraff, William D. Hinsberg 1991-09-03