Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12366800 | Method for improving accuracy of imprint force application in imprint lithography | Nilabh K. Roy | 2025-07-22 |
| 11994797 | System and method for shaping a film with a scaled calibration measurement parameter | Nilabh K. Roy, Xiaoming Lu | 2024-05-28 |
| 11776840 | Superstrate chuck, method of use, and method of manufacturing an article | Nilabh K. Roy, Seth J. Bamesberger, Ozkan Ozturk, Byung-Jin Choi | 2023-10-03 |
| 11656546 | Exposure apparatus for uniform light intensity and methods of using the same | Nilabh K. Roy, Masaki Saito | 2023-05-23 |
| 11614693 | Method of determining the initial contact point for partial fields and method of shaping a surface | Xiaoming Lu, Logan L. Simpson | 2023-03-28 |
| 11604409 | Template replication | Byung-Jin Choi, Anshuman Cherala | 2023-03-14 |
| 11590687 | Systems and methods for reducing pressure while shaping a film | Niyaz Khusnatdinov, Seth J. Bamesberger | 2023-02-28 |
| 11550216 | Systems and methods for curing a shaped film | Anshuman Cherala, Byung-Jin Choi | 2023-01-10 |
| 11480871 | Apparatus and method for improving accuracy of imprint force application in imprint lithography | Nilabh K. Roy | 2022-10-25 |
| 11454883 | Template replication | Byung-Jin Choi, Anshuman Cherala | 2022-09-27 |
| 11443940 | Apparatus for uniform light intensity and methods of using the same | Nilabh K. Roy, Masaki Saito | 2022-09-13 |
| 11347144 | Overlay improvement in nanoimprint lithography | Anshuman Cherala, Byung-Jin Choi | 2022-05-31 |
| 11161280 | Strain and kinetics control during separation phase of imprint process | Niyaz Khusnatdinov, Frank Y. Xu, Michael Nevin Miller, Ecron D. Thompson, Gerard Schmid +3 more | 2021-11-02 |
| 11104057 | Imprint apparatus and method of imprinting a partial field | Wei Zhang, Byung-Jin Choi, Zhengmao Ye | 2021-08-31 |
| 11073758 | Imprint apparatus control, control method and manufacturing method | Niyaz Khusnatdinov | 2021-07-27 |
| 11054739 | Imprint apparatus, control method, imprint method and manufacturing method | Niyaz Khusnatdinov | 2021-07-06 |
| 11020894 | Safe separation for nano imprinting | Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard Schmid +4 more | 2021-06-01 |
| 10996561 | Nanoimprint lithography with a six degrees-of-freedom imprint head module | Seth J. Bamesberger, Jeremy Lee Sevier, Byung-Jin Choi, Philip D. Schumaker | 2021-05-04 |
| 10996560 | Real-time correction of template deformation in nanoimprint lithography | Anshuman Cherala, Byung-Jin Choi | 2021-05-04 |
| 10866510 | Overlay improvement in nanoimprint lithography | Anshuman Cherala, Byung-Jin Choi | 2020-12-15 |
| 10578984 | Adaptive chucking system | Anshuman Cherala, Byung-Jin Choi | 2020-03-03 |
| 10553501 | Apparatus for use in forming an adaptive layer and a method of using the same | Anshuman Cherala | 2020-02-04 |
| 10534259 | Method and system for imprint force control | Byung-Jin Choi | 2020-01-14 |
| RE47483 | Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template | Douglas J. Resnick, Byung-Jin Choi, Sidlgata V. Sreenivasan | 2019-07-02 |
| 9778578 | Low contact imprint lithography template chuck system for improved overlay correction | Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger | 2017-10-03 |