DF

Debra Fenzel-Alexander

IBM: 5 patents #18,733 of 70,183Top 30%
Overall (All Time): #1,027,955 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7550254 Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Ratnam Sooriyakumaran, Robert David Allen 2009-06-23
7261992 Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Ratnam Sooriyakumaran, Robert David Allen 2007-08-28
7135595 Photoresist composition Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Carl E. Larson +5 more 2006-11-14
7014980 Photoresist composition Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Carl E. Larson +5 more 2006-03-21
6806026 Photoresist composition Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Carl E. Larson +5 more 2004-10-19