Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9171758 | Method of forming transistor contacts | Murshed Chowdhury, Aimin Xing | 2015-10-27 |
| 7893493 | Stacking fault reduction in epitaxially grown silicon | Yun-Yu Wang, Linda Black, Judson R. Holt, Scott Luning, Christopher D. Sheraw | 2011-02-22 |
| 7851376 | Compressive nitride film and method of manufacturing thereof | Daewon Yang, Tai-chi Su, Yun-Yu Wang | 2010-12-14 |
| 7790581 | Semiconductor substrate with multiple crystallographic orientations | Byeong Y. Kim, Xiaomeng Chen, Huilong Zhu | 2010-09-07 |
| 7776624 | Method for improving semiconductor surfaces | Ashima B. Chakravarti, Judson R. Holt, Jeremy J. Kempisty, Suk Hoon Ku, Amlan Majumdar +4 more | 2010-08-17 |
| 7682887 | Transistor having high mobility channel and methods | Omer H. Dokumaci | 2010-03-23 |
| 7674720 | Stacking fault reduction in epitaxially grown silicon | Yun-Yu Wang, Linda Black, Judson R. Holt, Scott Luning, Christopher D. Sheraw | 2010-03-09 |
| 7655557 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2010-02-02 |
| 7514370 | Compressive nitride film and method of manufacturing thereof | Daewon Yang, Tai-chi Su, Yun-Yu Wang | 2009-04-07 |
| 7439110 | Strained HOT (hybrid orientation technology) MOSFETs | Kangguo Cheng, Huilong Zhu | 2008-10-21 |
| 7411227 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2008-08-12 |
| 7232774 | Polycrystalline silicon layer with nano-grain structure and method of manufacture | Ashima B. Chakravarti, Bruce B. Doris, Romany Ghali, Oleg Gluschenkov, Michael A. Gribelyuk +1 more | 2007-06-19 |
| 7119016 | Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion | Ashima B. Chakravarti, Anita Madan, Gregory DiBello, Ramaseshan Iyer | 2006-10-10 |
| 7071103 | Chemical treatment to retard diffusion in a semiconductor overlayer | Kevin K. Chan, Huajie Chen, Michael A. Gribelyuk, Judson R. Holt, Ryan Mitchell +5 more | 2006-07-04 |
| 7056782 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2006-06-06 |
| 5923056 | Electronic components with doped metal oxide dielectric materials and a process for making electronic components with doped metal oxide dielectric materials | Lalita Manchanda | 1999-07-13 |