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CMOS structures and methods for improving yield |
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2016-04-19 |
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2015-07-14 |
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Method and apparatus for angular high density plasma chemical vapor deposition |
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2015-04-28 |
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Shallow trench isolation for device including deep trench capacitors |
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2014-03-25 |
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Semiconductor structure |
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2011-10-04 |
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2011-05-17 |
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Compressive nitride film and method of manufacturing thereof |
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2010-12-14 |
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Method of forming nitride films with high compressive stress for improved PFET device performance |
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Structure and method for reducing threshold voltage variation |
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2010-07-06 |
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HDP/PECVD methods of fabricating stress nitride structures for field effect transistors |
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2009-11-10 |
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Method of forming an interconnect including a dielectric cap having a tensile stress |
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2009-07-21 |
| 7521307 |
CMOS structures and methods using self-aligned dual stressed layers |
Huilong Zhu |
2009-04-21 |
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Dual layer stress liner for MOSFETS |
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2009-04-21 |
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Compressive nitride film and method of manufacturing thereof |
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2009-04-07 |
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Method of forming nitride films with high compressive stress for improved PFET device performance |
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Method of forming nitride films with high compressive stress for improved PFET device performance |
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HDP process for high aspect ratio gap filling |
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2005-07-05 |
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Stabilization of fluorine-containing dielectric materials in a metal insulator wiring structure |
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2005-06-28 |
