Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10916440 | Process and apparatus for processing a nitride structure without silica deposition | Derek Bassett, Antonio Luis Pacheco Rotondaro, Teruomi Minami, Takahiro Furukawa | 2021-02-09 |
| 10763120 | Colloidal silica growth inhibitor and associated method and system | Antonio Rotondaro | 2020-09-01 |
| 10515820 | Process and apparatus for processing a nitride structure without silica deposition | Derek Bassett, Antonio Luis Pacheco Rotondaro, Teruomi Minami, Takahiro Furukawa | 2019-12-24 |
| 10490399 | Systems and methodologies for vapor phase hydroxyl radical processing of substrates | Ian J. Brown | 2019-11-26 |
| 10429745 | Photo-sensitized chemically amplified resist (PS-CAR) simulation | Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell, Seiji Nagahara, Seiichi Tagawa | 2019-10-01 |
| 10325779 | Colloidal silica growth inhibitor and associated method and system | Antonio Rotondaro | 2019-06-18 |
| 10262880 | Cover plate for wind mark control in spin coating process | Derek Bassett, Joshua Hooge, Katsunori Ichino, Yuichi Terashita, Kousuke Yoshihara | 2019-04-16 |
| 10256163 | Method of treating a microelectronic substrate using dilute TMAH | Shuhei Takahashi, Naoyuki Okamura, Masami Yamashita, Derek Bassett, Antonio Luis Pacheco Rotondaro | 2019-04-09 |
| 10096480 | Method and apparatus for dynamic control of the temperature of a wet etch process | Antonio Luis Pacheco Rotondaro | 2018-10-09 |
| 10062586 | Chemical fluid processing apparatus and chemical fluid processing method | Derek Bassett, Gentaro Goshi, Hisashi Kawano, Yoshihiro Kai | 2018-08-28 |
| 10048587 | Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoir | Michael A. Carcasi, Joshua Hooge | 2018-08-14 |
| 9852920 | Etch system and method for single substrate processing | Ian J. Brown | 2017-12-26 |
| 9735026 | Controlling cleaning of a layer on a substrate using nozzles | Ian J. Brown, Benjamen M. Rathsack | 2017-08-15 |
| 9513556 | Method and system of process chemical temperature control using an injection nozzle | Ian J. Brown | 2016-12-06 |
| 9257292 | Etch system and method for single substrate processing | Ian J. Brown | 2016-02-09 |
| 9075318 | Sequential stage mixing for a resist batch strip process | Ian J. Brown | 2015-07-07 |
| 8574810 | Dual tone development with a photo-activated acid enhancement component in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Steven Scheer | 2013-11-05 |
| 8568964 | Flood exposure process for dual tone development in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Steven Scheer | 2013-10-29 |
| 7829269 | Dual tone development with plural photo-acid generators in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Steven Scheer | 2010-11-09 |