Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9454081 | Line pattern collapse mitigation through gap-fill material application | Benjamen M. Rathsack, Ian J. Brown, Steven Scheer, Joshua Hooge | 2016-09-27 |
| 9418860 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Makoto Muramatsu, Benjamen M. Rathsack, Tadatoshi Tomita, Hisashi Genjima, Hidetami Yaegashi +1 more | 2016-08-16 |
| 9412611 | Use of grapho-epitaxial directed self-assembly to precisely cut lines | Benjamen M. Rathsack | 2016-08-09 |
| 9349604 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Benjamen M. Rathsack | 2016-05-24 |
| 9147574 | Topography minimization of neutral layer overcoats in directed self-assembly applications | Benjamen M. Rathsack | 2015-09-29 |
| 9005877 | Method of forming patterns using block copolymers and articles thereof | Benjamen M. Rathsack, Meenakshisundaram Gandhi | 2015-04-14 |
| 8980538 | Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents | Michael A. Carcasi | 2015-03-17 |
| 8975009 | Track processing to remove organic films in directed self-assembly chemo-epitaxy applications | David Hetzer, Lior Huli | 2015-03-10 |
| 8795952 | Line pattern collapse mitigation through gap-fill material application | Benjamen M. Rathsack, Ian J. Brown, Steven Scheer, Joshua Hooge | 2014-08-05 |
| 8574810 | Dual tone development with a photo-activated acid enhancement component in lithographic applications | Carlos A. Fonseca, Steven Scheer, Wallace P. Printz | 2013-11-05 |
| 8568964 | Flood exposure process for dual tone development in lithographic applications | Carlos A. Fonseca, Steven Scheer, Wallace P. Printz | 2013-10-29 |
| 8449293 | Substrate treatment to reduce pattern roughness | Benjamin M. Rathsack, Steven Scheer | 2013-05-28 |
| 8435728 | Method of slimming radiation-sensitive material lines in lithographic applications | Michael A. Carcasi, Benjamin M. Rathsack | 2013-05-07 |
| 8338086 | Method of slimming radiation-sensitive material lines in lithographic applications | Michael A. Carcasi, Benjamin M. Rathsack | 2012-12-25 |
| 8318607 | Immersion lithography wafer edge bead removal for wafer and scanner defect prevention | Benjamen M. Rathsack | 2012-11-27 |
| 8283111 | Method for creating gray-scale features for dual tone development processes | Carlos A. Fonseca, Steven Scheer | 2012-10-09 |
| 8263309 | Composition and method for reducing pattern collapse | — | 2012-09-11 |
| 8263306 | Use of blended solvents in defectivity prevention | Benjamen M. Rathsack, David C. Hall | 2012-09-11 |
| 8257911 | Method of process optimization for dual tone development | Roel Gronheid, Sophie Bernard, Carlos A. Fonseca, Steven Scheer | 2012-09-04 |
| 8197996 | Dual tone development processes | Carlos A. Fonseca, Steven Scheer | 2012-06-12 |
| 8129089 | Use of blended solvents in defectivity prevention | Benjamen M. Rathsack, David C. Hall | 2012-03-06 |
| 8129080 | Variable resist protecting groups | Carlos A. Fonseca, Steven Scheer | 2012-03-06 |
| 8097402 | Using electric-field directed post-exposure bake for double-patterning (D-P) | Steven Scheer | 2012-01-17 |
| 7829269 | Dual tone development with plural photo-acid generators in lithographic applications | Carlos A. Fonseca, Steven Scheer, Wallace P. Printz | 2010-11-09 |
| 7595146 | Method of creating a graded anti-reflective coating | — | 2009-09-29 |