AO

Akihiro Oshima

OU Osaka University: 11 patents #32 of 1,984Top 2%
TL Tokyo Electron Limited: 5 patents #1,450 of 5,567Top 30%
DI Daikin Industries: 4 patents #820 of 2,957Top 30%
JS Jsr: 3 patents #346 of 1,137Top 35%
JI Japan Atomic Energy Research Institute: 2 patents #81 of 609Top 15%
MC Mitsumi Electric Co.: 1 patents #527 of 935Top 60%
YE Yokogawa Electric: 1 patents #658 of 1,441Top 50%
📍 Suita, JP: #90 of 1,253 inventorsTop 8%
Overall (All Time): #262,592 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
12227608 Method for producing low-molecular weight polytetrafluoroethylene, and powder Chisato HIGASHI, Eiji Masuda, Masayuki Tsuji, Akira Shimodo, Yasuhiro Nakano 2025-02-18
11780973 Method for producing low-molecular-weight polytetrafluoroethylene Takayuki Tanaka, Hideki Nakaya, Kazuyuki Satoh, Ryosuke Senba 2023-10-10
11634867 Method for producing paper Yoshikage OHMUKAI, Yuko Shiotani, Kazuyuki Satou, Michio Matsuda, Tomohiro Yoshida +1 more 2023-04-25
11623975 Molding material and method for producing resin molded body using same Kazuyuki Satoh, Mitsuhiro Usugaya, Yoshikage OHMUKAI, Yuko Shiotani 2023-04-11
10670967 Resist patterning method, latent resist image forming device, resist patterning device, and resist material Seiichi Tagawa 2020-06-02
10073348 Resist-pattern-forming method and chemically amplified resist material Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara 2018-09-11
10073349 Chemically amplified resist material, pattern-forming method, compound, and production method of compound Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara 2018-09-11
10025187 Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting Seiji Nagahara, Seiichi Tagawa 2018-07-17
10025190 Substrate treatment system Seiji Nagahara, Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI +2 more 2018-07-17
9977332 Resist patterning method, latent resist image forming device, resist patterning device, and resist material Seiichi Tagawa 2018-05-22
9971247 Pattern-forming method Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Seiichi Tagawa, Seiji Nagahara 2018-05-15
9742417 Self-oscillation circuit 2017-08-22
8917216 Antenna device with U-shaped slit Akira Miyoshi, Yoshiaki Imano 2014-12-23
7220799 Radiation-modified poly (tetrafluoroethylene) resin feeds and a process for producing the same Akira Udagawa 2007-05-22
6762215 Radiation-modified poly(tetrafluoroethylene) resin feeds and a process for producing the same Akira Udagawa 2004-07-13
6204301 Fluoroplastic composites and a process for producing the same Akira Udagawa, Yosuke Morita, Tadao Seguchi, Yoneho Tabata 2001-03-20
5444103 Modified polytetrafluoroethylene and process for its production by irradiation Yoneho Tabata, Kazushige Otsuhata, Tetsuya Ikeda, Kohji Ueno, Yuichi Yoshida +2 more 1995-08-22