WP

Wan Jae Park

Samsung: 17 patents #7,989 of 75,807Top 15%
SC Semes Co.: 11 patents #17 of 991Top 2%
IBM: 4 patents #21,733 of 70,183Top 35%
CM Chartered Semiconductor Manufacturing: 4 patents #148 of 840Top 20%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
AM AMD: 1 patents #5,683 of 9,279Top 65%
Overall (All Time): #121,092 of 4,157,543Top 3%
30
Patents All Time

Issued Patents All Time

Showing 25 most recent of 30 patents

Patent #TitleCo-InventorsDate
12340983 Apparatus for treating substrate and method for treating substrate Dong-Hun Kim, Ji Hoon Park, Du Ri Kim 2025-06-24
12341030 Support unit and substrate treating apparatus Kyung-Man Kim, Jeong Woo HAN, Ji Hwan Lee, Yoon Jong Ju, Seong Hak BAE 2025-06-24
12327735 Apparatus and method for processing substrate Seong Gil LEE, Sehoon Oh, Dong Sub Oh, Ji Hwan Lee, Dong-Hun Kim 2025-06-10
12315699 Substrate treating apparatus and substrate treating method Yoon Jong Ju, Seong Gil LEE, Jae Hwan Kim, Hye Joon KHEEL, Ji Hoon Park +1 more 2025-05-27
12308219 Substrate treating method and substrate treating apparatus Seong Gil LEE, Myoung Sub NOH, Dong-Hun Kim, Young Je UM, Dong Sub Oh +1 more 2025-05-20
12237151 Apparatus and method for processing substrate using plasma Seong Gil LEE, Young Je UM, Myoung Sub NOH, Dong Sub Oh, Min Sung Han +1 more 2025-02-25
12176185 Apparatus and method for processing substrate using plasma Min Sung Han, Jae Hoo Lee, Yoon Jong Ju 2024-12-24
12146710 Substrate treating apparatus and substrate treating system comprising the same Young Je UM, Joun Taek Koo, Dong-Hun Kim, Seong Gil LEE, Ji Hwan Lee +3 more 2024-11-19
12142492 Method for treating substrate and apparatus for treating substrate Ji Hwan Lee, Seong Gil LEE, Dong Sub Oh, MYOUNGSUB NOH, Dong-Hun Kim 2024-11-12
11978654 Substrate processing apparatus Min Sung Han, Yoon Jong Ju, Jaehoo Lee 2024-05-07
11372332 Plasma treatment method to improve photo resist roughness and remove photo resist scum Akiteru Ko 2022-06-28
10770294 Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance David L. O'Meara, Lior Huli, Soo Doo Chae 2020-09-08
9978567 Apparatus and method of treating a substrate Yong-Hyun Ham, Hyung Je Woo, Hyun-Joong Kim, Kyu Young Han 2018-05-22
8058176 Methods of patterning insulating layers using etching techniques that compensate for etch rate variations Kaushik A. Kumar, Joseph Edward Linville, Anthony D. Lisi, Ravi Prakash Srivastava, Hermann Wendt 2011-11-15
7560332 Integrated circuit capacitor structure Kyoung-Woo Lee, Jeong Hoon Ahn, Kyung-Tae Lee, Mu-kyeng Jung, Yong Jun Lee +2 more 2009-07-14
7553758 Method of fabricating interconnections of microelectronic device using dual damascene process Hyung-yoon Choi, Yi-Hsiung Lin, Tong Qing Chen 2009-06-30
7541290 Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing Chong-Kwang Chang, Len Yuan Tsou, Haoren Zhuang, Matthias Lipinsky, Shailendra Mishra 2009-06-02
7488687 Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers Jae Hak Kim, Tong Qing Chen, Yi-Hsiung Lin 2009-02-10
7435673 Methods of forming integrated circuit devices having metal interconnect structures therein Kyoung-Woo Lee, Ja-Hum Ku, Duk-Ho Hong 2008-10-14
7229875 Integrated circuit capacitor structure Kyoung-Woo Lee, Jeong Hoon Ahn, Kyung-Tae Lee, Mu-kyeng Jung, Yong Jun Lee +2 more 2007-06-12
7183195 Method of fabricating dual damascene interconnections of microelectronic device using hybrid low k-dielectric and carbon-free inorganic filler Kyoung-Woo Lee, Soo-geun Lee, Jae Hak Kim, Hong-Jae Shin 2007-02-27
7145140 Method of determining whether a conductive layer of a semiconductor device is exposed through a contact hold Ji Soo Kim, Kyoung-Sub Shin 2006-12-05
7033944 Dual damascene process Il-Goo Kim, Sang-rok Hah, Kyoung-Woo Lee 2006-04-25
6855629 Method for forming a dual damascene wiring pattern in a semiconductor device Jae Hak Kim, Soo-geun Lee, Kyoung-Woo Lee 2005-02-15
6849536 Inter-metal dielectric patterns and method of forming the same Soo-geun Lee, Ju-Hyuk Chung, Il-Goo Kim, Kyoung-Woo Lee, Jae Hak Kim 2005-02-01