Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7972874 | Semiconductor process evaluation methods including variable ion implanting conditions | Won-bae Jang, Seung Chul KIM, Chan-seung Choi, Min Kim, Chee-wan Kim +1 more | 2011-07-05 |
| 7807337 | Inductor for a system-on-a-chip and a method for manufacturing the same | Hyo-Jong Lee, Hong-Seong Son, Ui-Hyoung Lee, In-Ryong Kim, Yi-Gwon Kim | 2010-10-05 |
| 7781234 | Semiconductor process evaluation methods including variable ion implanting conditions | Won-bae Jang, Seung Chul KIM, Chan-seung Choi, Min Kim, Chee-wan Kim +1 more | 2010-08-24 |
| 7488235 | Polishing apparatus and related polishing methods | Moo-Yong Park, Jong-Gyoon Kim, Hong-Seong Son, Ja-Hyung Han | 2009-02-10 |
| 7237561 | Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same | Im-Soo Park, Kun-Tack Lee, Yong-Pil Han | 2007-07-03 |
| 7196010 | Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same | Young-rae Park, Jung-yup Kim, Bo-Un Yoon, Kwang-bok Kim, Jae-Phil Boo +3 more | 2007-03-27 |
| 7183226 | Method of forming a trench for use in manufacturing a semiconductor device | Sung Bae Lee, Hong-Seong Son | 2007-02-27 |
| 7157366 | Method of forming metal interconnection layer of semiconductor device | Il-Goo Kim, Sae-il Son, Kyoung-Woo Lee | 2007-01-02 |
| 7153370 | Method of cleaning semiconductor wafer | Kun-Tack Lee, Yong-Pil Han | 2006-12-26 |
| 7144815 | Chemical mechanical polishing slurry | Jae-Dong Lee, Bo-Un Yoon | 2006-12-05 |
| 7135413 | Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same | Kwang-Wook Lee, Im-Soo Park, Kun-Tack Lee, Young Min Kwon | 2006-11-14 |
| 7089947 | Apparatus and method for cleaning a semiconductor wafer | In-jun Yeo, Byoung-Moon Yoon, Kyung-Hyun Kim, Jeong-Lim Nam, Hyun Ho Jo | 2006-08-15 |
| 7066785 | Polishing apparatus and related polishing methods | Moo-Yong Park, Jong-Gyoon Kim, Hong-Seong Son, Ja-Hyung Han | 2006-06-27 |
| 7033944 | Dual damascene process | Wan Jae Park, Il-Goo Kim, Kyoung-Woo Lee | 2006-04-25 |
| 7026242 | Method for filling a hole with a metal | Hong-Seong Son, Il-Goo Kim, Jun-Hwan Oh | 2006-04-11 |
| 7017597 | Megasonic cleaning apparatus for fabricating semiconductor device | Byoung-Moon Yoon, In-jun Yeo, Kyung-Hyun Kim, Hyun Ho Jo, Jeong-Lim Nam | 2006-03-28 |
| 6976902 | Chemical mechanical polishing apparatus | Ja-Eung Koo, Jong Won Lee, Sung Bae Lee, Duk-Ho Hong, Hong-Seong Son | 2005-12-20 |
| 6930054 | Slurry composition for use in chemical mechanical polishing of metal wiring | Jae Seok Lee, Won Joong Do, Hyun Soo Roh, Kil Sung Lee, Jong Won Lee +3 more | 2005-08-16 |
| 6924207 | Method of fabricating a metal-insulator-metal capacitor | Hong-Seong Son, Ja-Eung Koo | 2005-08-02 |
| 6924228 | Method of forming a via contact structure using a dual damascene technique | Il-Goo Kim | 2005-08-02 |
| 6924234 | Method and apparatus for polishing a copper layer and method for forming a wiring structure using copper | Ja-Hyung Han, Hong-Seong Son, Duk-Ho Hong, Byung-Lyul Park | 2005-08-02 |
| 6914001 | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same | Jong Won Lee, Jae-Dong Lee, Bo-Un Yoon | 2005-07-05 |
| 6860277 | Single type of semiconductor wafer cleaning device | Kun-Tack Lee, Yong-Pil Han | 2005-03-01 |
| 6855267 | Chemical mechanical polishing slurry | Jae-Dong Lee, Bo-Un Yoon | 2005-02-15 |
| 6843257 | Wafer cleaning system | In-jun Yeo, Kyung-Hyun Kim, Jeong-Lim Nam, Byoung-Moon Yoon, Hyun Ho Cho | 2005-01-18 |