TY

Tugrul Yasar

TL Tokyo Electron Limited: 11 patents #663 of 5,567Top 15%
LL Lateral Research Limited Liability: 2 patents #30 of 92Top 35%
🗺 New York: #9,734 of 115,490 inventorsTop 9%
Overall (All Time): #326,008 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
7744735 Ionized PVD with sequential deposition and etching Rodney L. Robison, Jacques Faguet, Bruce Gittleman, Frank M. Cerio, Jr., Jozef Brcka 2010-06-29
6755945 Ionized PVD with sequential deposition and etching Glyn Reynolds, Frank M. Cerio, Jr., Bruce Gittleman, Michael Grapperhaus, Rodney L. Robison 2004-06-29
6730605 Redistribution of copper deposited films Chantal Arena-Foster, Robert F. Foster, Joseph T. Hillman, Thomas J. Licata 2004-05-04
6652711 Inductively-coupled plasma processing system Jozef Brcka, John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds +1 more 2003-11-25
6635569 Method of passivating and stabilizing a Ti-PECVD process chamber and combined Ti-PECVD/TiN-CVD processing method and apparatus Michael S. Ameen, Joseph T. Hillman, Gert Leusink, Michael G. Ward 2003-10-21
6632737 Method for enhancing the adhesion of a barrier layer to a dielectric Joseph T. Hillman, Richard Westhoff 2003-10-14
6548112 Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber Joseph T. Hillman, Kenichi Kubo, Vincent Vezin, Hideaki Yamasaki, Yasuhiko Kojima +2 more 2003-04-15
6417626 Immersed inductively—coupled plasma source Jozef Brcka, John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds +1 more 2002-07-09
6302057 Apparatus and method for electrically isolating an electrode in a PECVD process chamber Gerrit J. Leusink, Michael G. Ward, Tayler Bao, Jerry Yeh, Joseph T. Hillman 2001-10-16
6183615 Transport system for wafer processing line Rodney L. Robison, Daniel Deyo, Marian Zielinski 2001-02-06
5958134 Process equipment with simultaneous or sequential deposition and etching capabilities Ira Reiss, Subhadra Gupta, Rajendrapura Seetharamaiya Krishnaswamy, Israel A. Wagner 1999-09-28
5474667 Reduced stress sputtering target and method of manufacturing therefor Steven Hurwitt, Bhola De, Jon Hsu 1995-12-12
5408322 Self aligning in-situ ellipsometer and method of using for process monitoring Jon Hsu, Bhola De, Rodney L. Robison 1995-04-18
5105529 Process for airborne monolithic ferrite recording head with glass-protected self-aligned, machined track Robert T. Sturrock, Harry P. Harnischfeger 1992-04-21
5072322 Monolithic ferrite recording head with glass-protected, self-aligned, machined track Robert T. Sturrock, Harry P. Harnischfeger 1991-12-10