Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7556718 | Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer | — | 2009-07-07 |
| 7464662 | Compact, distributed inductive element for large scale inductively-coupled plasma sources | — | 2008-12-16 |
| 7435454 | Plasma enhanced atomic layer deposition system and method | — | 2008-10-14 |
| 7426900 | Integrated electrostatic inductive coupling for plasma processing | — | 2008-09-23 |
| 7407324 | Method and apparatus for monitoring the thickness of a conductive coating | — | 2008-08-05 |
| 7341959 | Plasma enhanced atomic layer deposition system and method | — | 2008-03-11 |
| 7273533 | Plasma processing system with locally-efficient inductive plasma coupling | Rodney L. Robison | 2007-09-25 |
| 7132128 | Method and system for depositing material on a substrate using a solid precursor | — | 2006-11-07 |
| 7075771 | Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system | — | 2006-07-11 |
| 6946054 | Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing | — | 2005-09-20 |
| 6853953 | Method for characterizing the performance of an electrostatic chuck | Bill D. Jones, Gert Leusink, Jeffrey Jay Long, Bill Oliver, Charles Tweed | 2005-02-08 |
| 6719886 | Method and apparatus for ionized physical vapor deposition | John Drewery, Glyn Reynolds, Derrek Andrew Russell, Mirko Vukovic, Michael Grapperhaus +2 more | 2004-04-13 |
| 6666982 | Protection of dielectric window in inductively coupled plasma generation | — | 2003-12-23 |
| 6652711 | Inductively-coupled plasma processing system | John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds, Mirko Vukovic +1 more | 2003-11-25 |
| 6523493 | Ring-shaped high-density plasma source and method | — | 2003-02-25 |
| 6494998 | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element | — | 2002-12-17 |
| 6474258 | Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma | — | 2002-11-05 |
| 6446572 | Embedded plasma source for plasma density improvement | — | 2002-09-10 |
| 6417626 | Immersed inductively—coupled plasma source | John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds, Mirko Vukovic +1 more | 2002-07-09 |
| 6287435 | Method and apparatus for ionized physical vapor deposition | John Drewery, Glyn Reynolds, Derrek Andrew Russell, Mirko Vukovic, Michael Grapperhaus +2 more | 2001-09-11 |
| 6237526 | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma | — | 2001-05-29 |