Issued Patents All Time
Showing 26–50 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6615098 | Method and apparatus for controlling a tool using a baseline control script | Christopher A. Bode, Alexander J. Pasadyn, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2003-09-02 |
| 6607926 | Method and apparatus for performing run-to-run control in a batch manufacturing environment | William J. Campbell, Christopher A. Bode | 2003-08-19 |
| 6595830 | Method of controlling chemical mechanical polishing operations to control erosion of insulating materials | Joyce S. Oey Hewett, Gerd Marxsen | 2003-07-22 |
| 6582618 | Method of determining etch endpoint using principal components analysis of optical emission spectra | Hongyu Yue | 2003-06-24 |
| 6564114 | Determining endpoint in etching processes using real-time principal components analysis of optical emission spectra | Joseph William Wiseman, Hongyu Yue | 2003-05-13 |
| 6560503 | Method and apparatus for monitoring controller performance using statistical process control | William J. Campbell | 2003-05-06 |
| 6560506 | Method and apparatus for control for semiconductor processing for reducing effects of environmental effects | — | 2003-05-06 |
| 6551751 | Method and apparatus for controlling a stepper | Richard D. Edwards, Curtis Warren Doss | 2003-04-22 |
| 6549822 | Method and apparatus for control of multi-cup semiconductor manufacturing tracks | — | 2003-04-15 |
| 6540591 | Method and apparatus for post-polish thickness and uniformity control | Alexander J. Pasadyn, Christopher H. Raeder | 2003-04-01 |
| 6535774 | Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller | Christopher A. Bode | 2003-03-18 |
| 6532428 | Method and apparatus for automatic calibration of critical dimension metrology tool | — | 2003-03-11 |
| 6529789 | Method and apparatus for automatic routing for reentrant processes | William J. Campbell, Christopher A. Bone | 2003-03-04 |
| 6528331 | Method for identifying and controlling impact of ambient conditions on photolithography processes | Christopher A. Bode | 2003-03-04 |
| 6511898 | Method for controlling deposition parameters based on polysilicon grain size feedback | Thomas J. Sonderman, Jeremy Lansford | 2003-01-28 |
| 6470230 | Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication | Michael L. Miller, Thomas J. Sonderman | 2002-10-22 |
| 6460002 | Method and apparatus for data stackification for run-to-run control | Christopher A. Bone | 2002-10-01 |
| 6442496 | Method and apparatus for dynamic sampling of a production line | Alexander J. Pasadyn | 2002-08-27 |
| 6440622 | Method for controlling and monitoring light source intensity | Richard D. Edwards, Curtis Warren Doss | 2002-08-27 |
| 6427093 | Method and apparatus for optimal wafer-by-wafer processing | — | 2002-07-30 |
| 6419846 | Determining endpoint in etching processes using principal components analysis of optical emission spectra | Joseph William Wiseman, Hongyu Yue | 2002-07-16 |
| 6417912 | Method and apparatus for controlling optical-parameters in a stepper | Scott Bushman, Richard D. Edwards, Edward C. Stewart | 2002-07-09 |
| 6410351 | Method and apparatus for modeling thickness profiles and controlling subsequent etch process | Christopher A. Bode | 2002-06-25 |
| 6409879 | System for controlling transistor spacer width | John R. Behnke, Matthew A. Purdy | 2002-06-25 |
| 6405144 | Method and apparatus for programmed latency for improving wafer-to-wafer uniformity | Paul Ackmann, Stuart E. Brown | 2002-06-11 |