Issued Patents All Time
Showing 25 most recent of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1093252 | Window visor extension | — | 2025-09-16 |
| 8322282 | Apparatus and process for transporting lithographic plates to a press cylinder | Dennis M. Burgess | 2012-12-04 |
| 7621219 | Method and apparatus for registration of an imaged lithographic plate | Dennis M. Burgess, Joseph A. Stein | 2009-11-24 |
| 7610855 | Apparatus and process for transporting lithographic plates to a press cylinder | Dennis M. Burgess | 2009-11-03 |
| 6856849 | Method for adjusting rapid thermal processing (RTP) recipe setpoints based on wafer electrical test (WET) parameters | Terrence J. Riley | 2005-02-15 |
| 6850322 | Method and apparatus for controlling wafer thickness uniformity in a multi-zone vertical furnace | Scott Bushman, Thomas J. Sonderman, Elfido Coss, Jr. | 2005-02-01 |
| 6819963 | Run-to-run control method for proportional-integral-derivative (PID) controller tuning for rapid thermal processing (RTP) | Terrence J. Riley | 2004-11-16 |
| 6650957 | Method and apparatus for run-to-run control of deposition process | Thomas J. Sonderman, Craig W. Christian | 2003-11-18 |
| 6607926 | Method and apparatus for performing run-to-run control in a batch manufacturing environment | Anthony J. Toprac, Christopher A. Bode | 2003-08-19 |
| 6592429 | Method and apparatus for controlling wafer uniformity in a chemical mechanical polishing tool using carrier head signatures | — | 2003-07-15 |
| 6567718 | Method and apparatus for monitoring consumable performance | Jeremy Lansford, Michael R. Conboy | 2003-05-20 |
| 6560503 | Method and apparatus for monitoring controller performance using statistical process control | Anthony J. Toprac | 2003-05-06 |
| 6556884 | Method and apparatus for interfacing a statistical process control system with a manufacturing process control framework | Michael L. Miller, Anatasia L. Oshelski | 2003-04-29 |
| 6546306 | Method for adjusting incoming film thickness uniformity such that variations across the film after polishing minimized | Scott Bushman | 2003-04-08 |
| 6529789 | Method and apparatus for automatic routing for reentrant processes | Anthony J. Toprac, Christopher A. Bone | 2003-03-04 |
| 6484064 | Method and apparatus for running metrology standard wafer routes for cross-fab metrology calibration | — | 2002-11-19 |
| 6475280 | Coating machine for applying and drying photosensitive emulsion on a plastic film | Dennis M. Burgess | 2002-11-05 |
| 6454899 | Apparatus for filling trenches | H. Jim Fulford, Christopher H. Raeder, Craig W. Christian, Thomas J. Sonderman | 2002-09-24 |
| 6376261 | Method for varying nitride strip makeup process based on field oxide loss and defect count | — | 2002-04-23 |
| 6360133 | Method and apparatus for automatic routing for reentrant process | Anthony J. Toprac, Christopher A. Bone | 2002-03-19 |
| 6352867 | Method of controlling feature dimensions based upon etch chemistry concentrations | Terri A. Couteau, Anthony J. Toprac | 2002-03-05 |
| 6350179 | Method for determining a polishing recipe based upon the measured pre-polish thickness of a process layer | Jeremy Lansford | 2002-02-26 |
| 6324341 | Lot-to-lot rapid thermal processing (RTP) chamber preheat optimization | Terrence J. Riley, Qingsu Wang, Michael L. Miller, Jeff Thompson | 2001-11-27 |
| 6284622 | Method for filling trenches | H. Jim Fulford, Christopher H. Raeder, Craig W. Christian, Thomas J. Sonderman | 2001-09-04 |
| 6265304 | Controlling an etching process of multiple layers based upon thickness ratio of the dielectric layers | — | 2001-07-24 |