Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6780568 | Phase-shift photomask for patterning high density features | John L. Nistler | 2004-08-24 |
| 6562521 | Semiconductor feature having support islands | John L. Nistler | 2003-05-13 |
| 6410191 | Phase-shift photomask for patterning high density features | John L. Nistler | 2002-06-25 |
| 6405144 | Method and apparatus for programmed latency for improving wafer-to-wafer uniformity | Anthony J. Toprac, Paul Ackmann | 2002-06-11 |
| 6271602 | Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate | Paul Ackmann, Richard D. Edwards, Khanh B. Nguyen | 2001-08-07 |
| 6207966 | Mark protection with transparent film | Khanh B. Nguyen, Harry J. Levinson, Richard D. Edwards, Paul Ackmann | 2001-03-27 |
| 6178256 | Removal of reticle effect on critical dimension by reticle rotation | Khanh B. Nguyen, Paul Ackmann | 2001-01-23 |