Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6331137 | Polishing pad having open area which varies with distance from initial pad surface | Christopher H. Raeder | 2001-12-18 |
| 6110294 | Apparatus and method for cleaning semiconductor wafer | Peter A. Burke | 2000-08-29 |
| 6106661 | Polishing pad having a wear level indicator and system using the same | Christopher H. Raeder, Peter A. Burke | 2000-08-22 |
| 6051495 | Seasoning of a semiconductor wafer polishing pad to polish tungsten | Peter A. Burke, Peter J. Beckage | 2000-04-18 |
| 5966766 | Apparatus and method for cleaning semiconductor wafer | Peter A. Burke | 1999-10-19 |