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Memory manufacturing process with bitline isolation |
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Hard mask process for memory device without bitline shorts |
Jean Y. Yang, Mark T. Ramsbey, Hidehiko Shiraiwa, Yider Wu, Tazrien Kamal |
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Memory manufacturing process using bitline rapid thermal anneal |
Jean Y. Yang, Arvind Halliyal, Amir H. Jafarpour, Tazrien Kamal, Mark T. Ramsbey +1 more |
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Memory wordline hard mask |
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Method of making memory wordline hard mask extension |
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Source drain implant during ONO formation for improved isolation of SONOS devices |
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2002-08-20 |
