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Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Daniel A. Steckert — 6 Patents

AMD: 3 patents #3,221 of 9,280Top 35%
Micron: 3 patents #3,533 of 6,374Top 60%
San Jose, CA: #9,609 of 32,062 inventorsTop 30%
California: #94,478 of 386,348 inventorsTop 25%
Overall (All Time): #779,687 of 4,157,543Top 20%
6 Patents All Time
Daniel A. Steckert has been granted 6 US patents while listed as an inventor at AMD. The first was granted in 1999 and the most recent in March 2014. Daniel A. Steckert ranks #779,687 of 4,157,543 US inventors in our database (top 18.8%). Patent records list Daniel A. Steckert in San Jose, CA, US.

Patents per Year

Patents granted per year, 1999 to 2014Bar chart with a peak of 2 patents in 1999.peak 21999: 2 patents19992000: 1 patents20002008: 1 patents20082011: 1 patents20112014: 1 patents2014

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8673787 Method to reduce charge buildup during high aspect ratio contact etch Gurtej S. Sandhu, Max Hineman, Jingyi Bai, Shane J. Trapp, Tony Schrock 2014-03-18 $9,836,000
7985692 Method to reduce charge buildup during high aspect ratio contact etch Gurtej S. Sandhu, Max Hineman, Jingyi Bai, Shane J. Trapp, Tony Schrock 2011-07-26 $4,523,000
7344975 Method to reduce charge buildup during high aspect ratio contact etch Gurtej S. Sandhu, Max Hineman, Jingyi Bai, Shane J. Trapp, Tony Schrock 2008-03-18 $1,356,000
6107172 Controlled linewidth reduction during gate pattern formation using an SiON BARC Chih-Yuh Yang, Scott A. Bell 2000-08-22 $6,781,000
5965461 Controlled linewidth reduction during gate pattern formation using a spin-on barc Chih-Yuh Yang, Scott A. Bell 1999-10-12 $2,065,000
5879975 Heat treating nitrogen implanted gate electrode layer for improved gate electrode etch profile Olov Karlsson, Effiong Ibok, Dong-Hyuk Ju, Scott A. Bell, Robert B. Ogle 1999-03-09 $5,385,000