Issued Patents All Time
Showing 76–100 of 190 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6617087 | Use of scatterometry to measure pattern accuracy | Bhanwar Singh, Ramkumar Subramanian | 2003-09-09 |
| 6612319 | Low defect EBR nozzle | Khoi A. Phan, Ursula Q. Quinto | 2003-09-02 |
| 6605855 | CVD plasma process to fill contact hole in damascene process | Bhanwar Singh, Michael K. Templeton, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2003-08-12 |
| 6602727 | Scatterometry based active control of exposure conditions | Bhanwar Singh, Ramkumar Subramanian | 2003-08-05 |
| 6594024 | Monitor CMP process using scatterometry | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Carmen Morales | 2003-07-15 |
| 6592932 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2003-07-15 |
| 6593210 | Self-aligned/maskless reverse etch process using an inorganic film | Bhanwar Singh, Ursula Q. Quinto | 2003-07-15 |
| 6583871 | System and method to measure closed area defects | Bhanwar Singh, Khoi A. Phan, Ramkumar Subramanian | 2003-06-24 |
| 6579733 | Using scatterometry to measure resist thickness and control implant | Bhanwar Singh, Ramkumar Subramanian | 2003-06-17 |
| 6579651 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh | 2003-06-17 |
| 6573480 | Use of thermal flow to remove side lobes | Ramkumar Subramanian, Michael K. Templeton | 2003-06-03 |
| 6573498 | Electric measurement of reference sample in a CD-SEM and method for calibration | Bhanwar Singh, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |
| 6573497 | Calibration of CD-SEM by e-beam induced current measurement | Bhanwar Singh, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |
| 6572252 | System and method for illuminating a semiconductor processing system | Bhanwar Singh, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-06-03 |
| 6570157 | Multi-pitch and line calibration for mask and wafer CD-SEM system | Bhanwar Singh, Khoi A. Phan | 2003-05-27 |
| 6561706 | Critical dimension monitoring from latent image | Bhanwar Singh, Michael K. Templeton, Ramkumar Subramanian | 2003-05-13 |
| 6562723 | Hybrid stack method for patterning source/drain areas | Jeffrey A. Shields, Ursula Q. Quinto | 2003-05-13 |
| 6562185 | Wafer based temperature sensors for characterizing chemical mechanical polishing processes | Steven C. Avanzino, Bhanwar Singh, Ramkumar Subramanian | 2003-05-13 |
| 6559457 | System and method for facilitating detection of defects on a wafer | Khoi A. Phan, Bhanwar Singh | 2003-05-06 |
| 6556303 | Scattered signal collection using strobed technique | Michael K. Templeton, Bhanwar Singh, Khoi A. Phan | 2003-04-29 |
| 6551923 | Dual width contact for charge gain reduction | Jeffrey A. Shields | 2003-04-22 |
| 6552790 | System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay | Michael K. Templeton | 2003-04-22 |
| 6545273 | Use of multiple tips on AFM to deconvolve tip effects | Bhanwar Singh, Sanjay K. Yedur | 2003-04-08 |
| 6541184 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2003-04-01 |
| 6537881 | Process for fabricating a non-volatile memory device | David K. Foote, Fei Wang, Steven K. Park | 2003-03-25 |