| 7591902 |
Recirculation and reuse of dummy dispensed resist |
Bharath Rangarajan, Ramkumar Subramanian, Khoi A. Phan, Michael Templeton |
2009-09-22 |
| 7153364 |
Re-circulation and reuse of dummy-dispensed resist |
Bharath Rangarajan, Ramkumar Subramanian, Khoi A. Phan, Michael K. Templeton |
2006-12-26 |
| 6612319 |
Low defect EBR nozzle |
Bharath Rangarajan, Khoi A. Phan |
2003-09-02 |
| 6593210 |
Self-aligned/maskless reverse etch process using an inorganic film |
Bharath Rangarajan, Bhanwar Singh |
2003-07-15 |
| 6562723 |
Hybrid stack method for patterning source/drain areas |
Bharath Rangarajan, Jeffrey A. Shields |
2003-05-13 |
| 6534243 |
Chemical feature doubling process |
Michael K. Templeton, Ramkumar Subramanian, Bharath Rangarajan, Kathleen R. Early |
2003-03-18 |
| 6439963 |
System and method for mitigating wafer surface disformation during chemical mechanical polishing (CMP) |
Bharath Rangarajan, Bhanwar Singh |
2002-08-27 |
| 6362052 |
Use of an etch to reduce the thickness and around the edges of a resist mask during the creation of a memory cell |
Bharath Rangarajan, Fei Wang, George J. Kluth |
2002-03-26 |
| 6277544 |
Reverse lithographic process for semiconductor spaces |
Bhanwar Singh, Bharath Rangarajan |
2001-08-21 |
| 6274289 |
Chemical resist thickness reduction process |
Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan |
2001-08-14 |
| 6221777 |
Reverse lithographic process for semiconductor vias |
Bhanwar Singh, Bharath Rangarajan |
2001-04-24 |
| 6210846 |
Exposure during rework for enhanced resist removal |
Bharath Rangarajan, Bhanwar Singh |
2001-04-03 |
