Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7080330 | Concurrent measurement of critical dimension and overlay in semiconductor manufacturing | Bryan K. Choo, Bharath Rangarajan, Bhanwar Singh | 2006-07-18 |
| 6597463 | System to determine suitability of sion arc surface for DUV resist patterning | Bhanwar Singh, Cristina Cheung, Jay Bhakta, Junwei Bao | 2003-07-22 |
| 6594024 | Monitor CMP process using scatterometry | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2003-07-15 |
| 6515342 | Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion | Subhash Gupta, Bhanwar Singh | 2003-02-04 |
| 6501534 | Automated periodic focus and exposure calibration of a lithography stepper | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan | 2002-12-31 |
| 6479817 | Cantilever assembly and scanning tip therefor with associated optical sensor | Sanjay K. Yedur, Bhanwar Singh, Bryan K. Choo | 2002-11-12 |
| 6459945 | System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process | Bhanwar Singh, Bharath Rangarajan | 2002-10-01 |
| 6452161 | Scanning probe microscope having optical fiber spaced from point of hp | Sanjay K. Yedur, Bhanwar Singh, Bryan K. Choo | 2002-09-17 |
| 6429141 | Method of manufacturing a semiconductor device with improved line width accuracy | Minh Van Ngo, Bhanwar Singh, Dawn Hopper | 2002-08-06 |
| 6383947 | Anti-reflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies | Paul R. Besser, Bhanwar Singh, Darrell M. Erb, Susan H. Chen | 2002-05-07 |
| 6165855 | Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies | Paul R. Besser, Bhanwar Singh, Darrell M. Erb, Susan H. Chen | 2000-12-26 |
| 6093973 | Hard mask for metal patterning | Minh Van Ngo, Bhanwar Singh, Dawn Hopper | 2000-07-25 |
| 6066578 | Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion | Subhash Gupta, Bhanwar Singh | 2000-05-23 |
| 6063531 | Focus monitor structure and method for lithography process | Bhanwar Singh, Bharath Rangarajan, Khoi A. Phan | 2000-05-16 |