Issued Patents All Time
Showing 76–100 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6417084 | T-gate formation using a modified conventional poly process | Bhanwar Singh, Marina V. Plat, Ramkumar Subramanian | 2002-07-09 |
| 6403456 | T or T/Y gate formation using trim etch processing | Marina V. Plat, Bhanwar Singh, Ramkumar Subramanian | 2002-06-11 |
| 6399284 | Sub-lithographic contacts and vias through pattern, CVD and etch back processing | — | 2002-06-04 |
| 6391525 | Sidewall patterning for sub 100 nm gate conductors | — | 2002-05-21 |
| 6383952 | RELACS process to double the frequency or pitch of small feature formation | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat, Scott A. Bell | 2002-05-07 |
| 6380047 | Shallow trench isolation formation with two source/drain masks and simplified planarization mask | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Larry Wang, Effiong Ibok | 2002-04-30 |
| 6380588 | Semiconductor device having uniform spacers | William G. En, Minh Van Ngo, Chih-Yuk Yang, David K. Foote, Scott A. Bell +1 more | 2002-04-30 |
| 6380067 | Method for creating partially UV transparent anti-reflective coating for semiconductors | Ramkumar Subramanian, Minh Van Ngo, Suzette K. Pangrle, Kashmir Sahota | 2002-04-30 |
| 6358856 | Bright field image reversal for contact hole patterning | Ramkumar Subramanian, Marina V. Plat, Todd P. Lukanc | 2002-03-19 |
| 6350559 | Method for creating thinner resist coating that also has fewer pinholes | Michael K. Templeton, Kathleen R. Early | 2002-02-26 |
| 6326231 | Use of silicon oxynitride ARC for metal layers | Ramkumar Subramanian, Bhanwar Singh, Sanjay K. Yedur, Marina V. Plat, Bharath Rangarajan +1 more | 2001-12-04 |
| 6326319 | Method for coating ultra-thin resist films | Christopher Lee Pike, Khanh B. Nguyen | 2001-12-04 |
| 6319802 | T-gate formation using modified damascene processing with two masks | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat | 2001-11-20 |
| 6319843 | Nitride surface passivation for acid catalyzed chemically amplified resist processing | — | 2001-11-20 |
| 6316277 | Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithography | Khoi A. Phan, Khanh B. Nguyen, Jeff Schefske | 2001-11-13 |
| 6313019 | Y-gate formation using damascene processing | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat | 2001-11-06 |
| 6309926 | Thin resist with nitride hard mask for gate etch application | Scott A. Bell, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2001-10-30 |
| 6306560 | Ultra-thin resist and SiON/oxide hard mask for metal etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2001-10-23 |
| 6291137 | Sidewall formation for sidewall patterning of sub 100 nm structures | Michael K. Templeton, Kathleen R. Early | 2001-09-18 |
| 6287959 | Deep submicron metallization using deep UV photoresist | Bhanwar Singh | 2001-09-11 |
| 6270929 | Damascene T-gate using a relacs flow | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat | 2001-08-07 |
| 6255202 | Damascene T-gate using a spacer flow | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat | 2001-07-03 |
| 6245493 | Method for reducing surface reflectivity by increasing surface roughness | Bhanwar Singh, Bharath Rangarajan, Sanjay K. Yedur, Michael K. Templeton | 2001-06-12 |
| 6239031 | Stepper alignment mark structure for maintaining alignment integrity | Nick Kepler, Olov Karlsson, Larry Wang, Basab Bandyopadhyah, Effiong Ibok | 2001-05-29 |
| 6214737 | Simplified sidewall formation for sidewall patterning of sub 100 nm structures | Michael K. Templeton, Kathleen R. Early | 2001-04-10 |