Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6316277 | Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithography | Khoi A. Phan, Christopher F. Lyons, Khanh B. Nguyen | 2001-11-13 |
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6316277 | Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithography | Khoi A. Phan, Christopher F. Lyons, Khanh B. Nguyen | 2001-11-13 |