Issued Patents All Time
Showing 126–147 of 147 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6057206 | Mark protection scheme with no masking | Khanh B. Nguyen, Marina V. Plat, Harry J. Levinson | 2000-05-02 |
| 6057080 | Top antireflective coating film | William R. Brunsvold, George J. Hefferon, Wayne M. Moreau, Robert L. Wood | 2000-05-02 |
| 6037671 | Stepper alignment mark structure for maintaining alignment integrity | Nick Kepler, Olov Karlsson, Larry Wang, Basab Bandyopadhyay, Effiong Ibok | 2000-03-14 |
| 6020269 | Ultra-thin resist and nitride/oxide hard mask for metal etch | Fei Wang, Khanh B. Nguyen, Scott A. Bell, Harry J. Levinson, Chih-Yuh Yang | 2000-02-01 |
| 5990524 | Silicon oxime spacer for preventing over-etching during local interconnect formation | William G. En, Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Scott A. Bell +1 more | 1999-11-23 |
| 5970363 | Shallow trench isolation formation with improved trench edge oxide | Nick Kepler, Olov Karlsson, Larry Wang, Basab Bandyopadhyay, Effiong Ibok | 1999-10-19 |
| 5970362 | Simplified shallow trench isolation formation with no polish stop | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Larry Wang, Effiong Ibok | 1999-10-19 |
| 5963841 | Gate pattern formation using a bottom anti-reflective coating | Olov Karlsson, Minh Van Ngo, Scott A. Bell, David K. Foote | 1999-10-05 |
| 5930645 | Shallow trench isolation formation with reduced polish stop thickness | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Larry Wang, Effiong Ibok | 1999-07-27 |
| 5910337 | Phase-averaging resist coating for reflectivity control | Gary T. Spinillo, Robert L. Wood | 1999-06-08 |
| 5821036 | Method of developing positive photoresist and compositions therefor | Stanley A. Ficner, John Magvas, Wayne M. Moreau, Marina V. Plat | 1998-10-13 |
| 5807790 | Selective i-line BARL etch process | Subash Gupta | 1998-09-15 |
| 5744537 | Antireflective coating films | William R. Brunsvold, George J. Hefferon, Wayne M. Moreau, Robert L. Wood | 1998-04-28 |
| 5554485 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Wayne M. Moreau, Ratnam Sooriyakumaran +3 more | 1996-09-10 |
| 5482817 | Mid and deep-uv antireflection coatings and methods for use thereof | Robert R. Dichiara, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood | 1996-01-09 |
| 5401614 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Wayne M. Moreau, Ratnam Sooriyakumaran +3 more | 1995-03-28 |
| 5380621 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, Ratnasabapathy Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood | 1995-01-10 |
| 5273856 | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation | Stanley E. Perreault, Gary T. Spinillo, Robert L. Wood | 1993-12-28 |
| 5240812 | Top coat for acid catalyzed resists | Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Steve S. Miura +3 more | 1993-08-31 |
| 5227280 | Resists with enhanced sensitivity and contrast | James A. Jubinsky, Steven M. Katz, Wayne M. Moreau | 1993-07-13 |
| 4474864 | Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist | Ming-Fea Chow, Alexander D. Lopata, Robert C. McIntosh, Anthony F. Scaduto | 1984-10-02 |
| 4379830 | Developer for positive photolithographic articles | Albert S. Deutsch, Robert Piller | 1983-04-12 |