| 6114085 |
Antireflective composition for a deep ultraviolet photoresist |
Munirathna Padmanaban, Ralph R. Dammel, Joseph E. Oberlander, John P. Sagan |
2000-09-05 |
| 5821036 |
Method of developing positive photoresist and compositions therefor |
John Magvas, Christopher F. Lyons, Wayne M. Moreau, Marina V. Plat |
1998-10-13 |
| 5612164 |
Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone |
Anthony Canize, Ping-Hung Lu, Walter Spiess |
1997-03-18 |
| 5258260 |
Aqueous developable deep UV negative resist |
Sydney George Slater |
1993-11-02 |
| 5258265 |
Aqueous developable deep UV negative resist |
Sydney George Slater |
1993-11-02 |
| 5178987 |
Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin |
Sydney George Slater |
1993-01-12 |
| 4902603 |
Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins |
Sydney George Slater |
1990-02-20 |
| 4251491 |
Process for making sodium tripolyphosphate from wet process phosphoric acid |
Andrew J. Klanica, Theodore F. Korenowski |
1981-02-17 |