Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11421128 | Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer | M. Dalil Rahman, Huirong Yao, JoonYeon Cho, Elizabeth WOLFER | 2022-08-23 |
| 11031237 | Aromatic amino siloxane functionalized materials for use in capping porous dielectrics | Sachin BOBADE, Orest Polishchuk, Durairaj BASKARAN | 2021-06-08 |
| 9418836 | Polyoxometalate and heteropolyoxometalate compositions and methods for their use | Venkata Gopal Reddy Chada, Huirong Yao, JoonYeon Cho, Elizabeth WOLFER, Alberto D. Dioses +1 more | 2016-08-16 |
| 9409793 | Spin coatable metallic hard mask compositions and processes thereof | Venkata Gopal Reddy Chada, Huirong Yao, Salem K. Mullen, Elizabeth WOLFER, Alberto D. Dioses +1 more | 2016-08-09 |
| 9315636 | Stable metal compounds, their compositions and methods | Huirong Yao, M. Dalil Rahman, Salem K. Mullen, JoonYeon Cho, Clement Anyadiegwu | 2016-04-19 |
| 9296922 | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use | Huirong Yao, Salem K. Mullen, Elizabeth WOLFER, Douglas McKenzie, JoonYeon Cho | 2016-03-29 |
| 9274426 | Antireflective coating compositions and processes thereof | M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu +1 more | 2016-03-01 |
| 8900797 | Developable bottom anti-reflective coating | Shigemasa Nakasugi, Shinji Miyazaki, Alberto D. Dioses | 2014-12-02 |
| 8796398 | Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern | Jin Li, Toru Koike, Yusuke Takano, Kazunori Kurosawa | 2014-08-05 |
| 8697336 | Composition for forming a developable bottom antireflective coating | Shigemasa Nakasugi, Kazuma Yamamoto, Yasushi Akiyama, Shinji Miyazaki, Srinivasan Chakrapani | 2014-04-15 |
| 8632948 | Positive-working photoimageable bottom antireflective coating | Srinivasan Chakrapani, Francis Houlihan, Shinji Miyazaki, Edward Ng, Mark Neisser | 2014-01-21 |
| 8623589 | Bottom antireflective coating compositions and processes thereof | Takanori Kudo, Alberto D. Dioses, Edward Ng, Srinivasan Chakrapani | 2014-01-07 |
| 8252503 | Photoresist compositions | Srinivasan Chakrapani, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz | 2012-08-28 |
| 7833693 | Photoactive compounds | M. Dalil Rahman, Francis Houlihan, Sangho Lee, Ralph R. Dammel, David L. Rentkiewicz +1 more | 2010-11-16 |
| 7678528 | Photoactive compounds | M. Dalil Rahman | 2010-03-16 |
| 7595141 | Composition for coating over a photoresist pattern | Takanori Kudo, Ralph R. Dammel | 2009-09-29 |
| 7537879 | Photoresist composition for deep UV and process thereof | Francis Houlihan, Ralph R. Dammel, Andrew R. Romano, M. Dalil Rahman | 2009-05-26 |
| 7521170 | Photoactive compounds | M. Dalil Rahman, Francis Houlihan, Sangho Lee, Ralph R. Dammel, David L. Rentkiewicz +1 more | 2009-04-21 |
| 7491482 | Photoactive compounds | Srinivasan Chakrapani, M. Dalil Rahman | 2009-02-17 |
| 7122291 | Photoresist compositions | Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman | 2006-10-17 |
| 6991888 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | Takanori Kudo, Sangho Lee, Ralph R. Dammel, M. Dalil Rahman | 2006-01-31 |
| 6803168 | Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition | Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski | 2004-10-12 |
| 6800416 | Negative deep ultraviolet photoresist | Takanori Kudo, Ralph R. Dammel, Medhat A. Touky | 2004-10-05 |
| 6737492 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo, Georg Pawlowski | 2004-05-18 |
| 6723488 | Photoresist composition for deep UV radiation containing an additive | Takanori Kudo, Ralph R. Dammel | 2004-04-20 |