Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6610465 | Process for producing film forming resins for photoresist compositions | M. Dalil Rahman, Douglas McKenzie, Takanori Kudo | 2003-08-26 |
| 6468718 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo, Georg Pawlowski | 2002-10-22 |
| 6447980 | Photoresist composition for deep UV and process thereof | M. Dalil Rahman, Ralph R. Dammel | 2002-09-10 |
| 6365322 | Photoresist composition for deep UV radiation | Ralph R. Dammel | 2002-04-02 |
| 6329117 | Antireflection or light-absorbing coating composition and polymer therefor | Wen-Bing Kang, Georg Pawlowski, Ken Kimura, Hatsuyuki Tanaka | 2001-12-11 |
| 6277750 | Composition for bottom reflection preventive film and novel polymeric dye for use in the same | Georg Pawlowski, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Yoshinori Nishiwaki | 2001-08-21 |
| 6114085 | Antireflective composition for a deep ultraviolet photoresist | Ralph R. Dammel, Stanley A. Ficner, Joseph E. Oberlander, John P. Sagan | 2000-09-05 |
| 5852128 | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Georg Pawlowski, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Satoru Funato +1 more | 1998-12-22 |
| 5846690 | Radiation-sensitive composition containing plasticizer | Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Natsumi Kawasaki, Satoru Funato +1 more | 1998-12-08 |
| 5843319 | Positive-working radiation-sensitive mixture | Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro +4 more | 1998-12-01 |
| 5773191 | Radiation-sensitive composition | Yoshiaki Kinoshita, Satoru Funato, Natsumi Kawasaki, Hiroshi Okazaki, Georg Pawlowski | 1998-06-30 |
| 5738972 | Radiation sensitive composition | Natsumi Suehiro, Yoshiaki Kinoshita, Satoru Funato, Seiya Masuda, Hiroshi Okazaki +1 more | 1998-04-14 |
| 5663035 | Radiation-sensitive mixture comprising a basic iodonium compound | Seiya Masuda, Takanori Kudo, Yoshiaki Kinoshita, Natsumi Suehiro, Yuko Nozaki +2 more | 1997-09-02 |
| 5641594 | Colored, photosensitive resin composition | Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo, Hiroshi Okazaki +3 more | 1997-06-24 |
| 5595855 | Radiation sensitive composition | Yoshiaki Kinoshita, Natsumi Suehiro, Takanori Kudo, Seiya Masuda, Yuko Nozaki +2 more | 1997-01-21 |
| 5525453 | Positive-working radiation-sensitive mixture | Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natumi Suehiro +4 more | 1996-06-11 |