Issued Patents All Time
Showing 1–25 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10268117 | Top-layer membrane formation composition and method for forming resist pattern using same | Masato Suzuki, Xiaowei Wang, Tetsuo Okayasu, Yusuke Hama | 2019-04-23 |
| 9810988 | Composition for forming overlay film, and resist pattern formation method employing the same | Xiaowei Wang, Masato Suzuki, Tetsuo Okayasu | 2017-11-07 |
| 9804493 | Composition for forming topcoat layer and resist pattern formation method employing the same | Hyun-Woo Kim, Cheol-Hong Park, Tetsuo Okayasu, Xiaowei Wang, Yusuke Hama | 2017-10-31 |
| 9505721 | Aromatic imide compound and method for producing same | Eri Hirahara, Ralph R. Dammel | 2016-11-29 |
| 9482952 | Composition for forming topcoat layer and resist pattern formation method employing the same | Xiaowei Wang, Tetsuo Okayasu, Takafumi KINUTA | 2016-11-01 |
| 9298094 | Composition for forming fine pattern and method for forming fined pattern using same | Toshira Okamura, Masahiro Ishii | 2016-03-29 |
| 9298095 | Rinse solution for lithography and pattern formation method employing the same | Xiaowei Wang, Yuriko Matsuura | 2016-03-29 |
| 7816071 | Process of imaging a photoresist with multiple antireflective coatings | David Abdallah, Mark Neisser, Ralph R. Dammel, John Biafore, Andrew R. Romano | 2010-10-19 |
| 7601482 | Negative photoresist compositions | Chunwei Chen, Joseph E. Oberlander, Robert Plass | 2009-10-13 |
| 6803168 | Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition | Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura | 2004-10-12 |
| 6737492 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo | 2004-05-18 |
| 6686121 | Process for preparing resists | Hiroshi Okazaki, Satoru Funato, Yoshiaki Kinoshita, Yuko Yamaguchi | 2004-02-03 |
| 6468718 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Takanori Kudo | 2002-10-22 |
| 6358665 | Radiation-sensitive composition of chemical amplification type | Hiroshi Okazaki, Yoshiaki Kinoshita, Naoko Tsugama, Aritaka Hishida, Xiao-Ming Ma +1 more | 2002-03-19 |
| 6329117 | Antireflection or light-absorbing coating composition and polymer therefor | Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Hatsuyuki Tanaka | 2001-12-11 |
| 6284427 | Process for preparing resists | Hiroshi Okazaki, Satoru Funato, Yoshiaki Kinoshita, Yuko Yamaguchi | 2001-09-04 |
| 6277750 | Composition for bottom reflection preventive film and novel polymeric dye for use in the same | Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Yoshinori Nishiwaki | 2001-08-21 |
| 6063545 | Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture | Horst Roeschert, Juergen Fuchs, Walter Spiess, Charlotte Eckes, Ralph R. Dammel | 2000-05-16 |
| 5852128 | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Munirathna Padmanaban, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Satoru Funato +1 more | 1998-12-22 |
| 5846690 | Radiation-sensitive composition containing plasticizer | Munirathna Padmanaban, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Natsumi Kawasaki +1 more | 1998-12-08 |
| 5843319 | Positive-working radiation-sensitive mixture | Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro +4 more | 1998-12-01 |
| 5776658 | Silicone-compatible photoinitiators, and photosensitive mixtures comprising them | Claus-Peter Niesert, Willi-Kurt Gries, Klaus-Juergen Przybilla | 1998-07-07 |
| 5773191 | Radiation-sensitive composition | Munirathna Padmanaban, Yoshiaki Kinoshita, Satoru Funato, Natsumi Kawasaki, Hiroshi Okazaki | 1998-06-30 |
| 5738972 | Radiation sensitive composition | Munirathna Padmanaban, Natsumi Suehiro, Yoshiaki Kinoshita, Satoru Funato, Seiya Masuda +1 more | 1998-04-14 |
| 5716756 | Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use | Walter Spiess, Horst Roeschert, Wolfgang Appel, Walter Herr | 1998-02-10 |