Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6063545 | Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture | Horst Roeschert, Juergen Fuchs, Walter Spiess, Georg Pawlowski, Ralph R. Dammel | 2000-05-16 |
| 5346804 | Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture | Geog Pawlowski, Ralph R. Dammel, Horst Roeschert, Walter Spiess | 1994-09-13 |
| 5346806 | Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture | Georg Pawlowski, Ralph R. Dammel, Horst Roeschert, Walter Spiess | 1994-09-13 |
| 5198325 | Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator | Bernd Hupfer, Gerhard Buhr | 1993-03-30 |