Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5998567 | Radiation-sensitive mixture | Mathias Eichhorn | 1999-12-07 |
| 5879852 | Positive-working radiation-sensitive mixture | Mathias Eichhorn | 1999-03-09 |
| 5834157 | 2-acylamino-9-arylacridines, process for their preparation and photosensitive mixtures containing them | Siegfried Scheler, Klaus Bergmann | 1998-11-10 |
| 5776652 | Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures | Mathias Eichhorn | 1998-07-07 |
| 5753405 | Positive-working recording material containing aluminum base and mat-finished quinone diazide layer developable in weak alkaline developers | Andreas Elsaesser | 1998-05-19 |
| 5725992 | Process for the production of a multicolored image and photosensitive material for carrying out this process | Stephan J. W. Platzer, Wojciech A. Wilczak, Dieter Mohr | 1998-03-10 |
| 5705317 | Radiation-sensitive mixture | Mathias Eichhorn | 1998-01-06 |
| 5693449 | Process for the production of a multicolored image and photosensitive material for carrying out this process | Stephan J. W. Platzer, Wojciech A. Wilczak, Dieter Mohr | 1997-12-02 |
| 5654121 | Positive-working radiation-sensitive mixture | Mathias Eichhorn | 1997-08-05 |
| 5612169 | N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith | Mathias Eichhorn | 1997-03-18 |
| 5563018 | (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material | Wolfgang Zahn, Fritz Erdmann, Siegfried Scheler | 1996-10-08 |
| 5534373 | Peel-apart process for the production of a colored image and imaged product produced through the process | Stephan J. W. Platzer, Andrea Buchmann | 1996-07-09 |
| 5529883 | Photosensitive material for the production of a colored image utilizing adhesion promoting layer | Stephan J. W. Platzer, Andrea Buchmann | 1996-06-25 |
| 5529886 | Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof | Mathias Eichhorn | 1996-06-25 |
| 5498506 | Positive-acting radiation-sensitive mixture and recording material produced therewith | Horst Wengenroth, Horst Roeschert, Walter Spiess, Georg Pawlowski | 1996-03-12 |
| 5442087 | Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof | Mathias Eichhorn | 1995-08-15 |
| 5413899 | Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters | Siegfried Scheler, Andreas Elsaesser, Klaus Bergmann, Wolfgang Zahn | 1995-05-09 |
| 5397846 | Process for preparing organic compounds carrying tert-butyloxycarbonyl groups | Mathias Eichhorn | 1995-03-14 |
| 5374184 | Photopolymerizable material and process for the production of a colored image | Stephan J. W. Platzer, Manfred Michel, Andrea Buchmann | 1994-12-20 |
| 5368975 | Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility | Andreas Elsaessser, Hans W. Frass, Otfried Gaschler, Dieter Mohr | 1994-11-29 |
| 5306595 | Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith | Siegfried Scheler, Wolfgang Zahn, Axel Schmitt | 1994-04-26 |
| 5292626 | Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers | Andreas Elsaesser, Hans W. Frass, Ernst I. Leupold | 1994-03-08 |
| 5268252 | Radiation-sensitive ester and process for its preparation | Siegfried Scheler, Wolfgang Zahn, Axel Schmitt | 1993-12-07 |
| 5206111 | Binders soluble in aqueous alkali and containing silanyl groups in the side chain for a photosensitive mixture | Peter Wilharm, Juergen Fuchs | 1993-04-27 |
| 5198325 | Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator | Bernd Hupfer, Charlotte Eckes | 1993-03-30 |