FE

Fritz Erdmann

Hoechst Gmbh: 8 patents #474 of 4,020Top 15%
Overall (All Time): #591,124 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
5563018 (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material Gerhard Buhr, Wolfgang Zahn, Siegfried Scheler 1996-10-08
5358823 Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone Wolfgang Zahn, Hans-Joachim Merrem, Axel Schmitt 1994-10-25
5216158 Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation Georg Pawlowski, Heidrun Lutz 1993-06-01
5064959 Aromatic compounds substituted by 4,6-bis(trichloromethyl)-s-triazin-2-yl groups Georg Pawlowski, Heidrun Lutz 1991-11-12
4873169 Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same Horst-Dieter Thamm, Hans J. Staudt 1989-10-10
4555469 Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester Ulrich Simon 1985-11-26
4492748 Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith Walter Lutz, Hartmut Steppan 1985-01-08
4424270 Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester Ulrich Simon 1984-01-03
4266000 Photosensitive copying composition Paul Stahlhofen 1981-05-05