Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5399463 | Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer | — | 1995-03-21 |
| 5358823 | Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone | Wolfgang Zahn, Fritz Erdmann, Axel Schmitt | 1994-10-25 |
| 5340682 | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound | Georg Pawlowski, Juergen Lingnau, Ralph R. Dammel, Horst Roeschert | 1994-08-23 |
| 5338641 | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound | Georg Pawlowski, Juergen Lingnau, Ralph R. Dammel, Horst Roeschert | 1994-08-16 |
| 5334481 | Positive diazo quinone photoresist compositions containing antihalation compound | — | 1994-08-02 |
| 5326826 | Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation | Horst Roeschert, Georg Pawlowski, Juergen Fuchs, Ralph R. Dammel | 1994-07-05 |
| 5302488 | Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material | Horst Roeschert, Georg Pawlowski, Juergen Fuchs, Ralph R. Dammel | 1994-04-12 |
| 5256517 | Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units | Horst Roeschert, Georg Pawlowski, Ralph R. Dammel, Walter Spiess | 1993-10-26 |
| 5198322 | Positively operating radiation-sensitive mixture containing a polyfunctional .alpha.-diazo-.beta.-keto ester and radiation-sensitive recording material containing this mixture | Peter Wilharm, Georg Pawlowski, Ralph R. Dammel | 1993-03-30 |
| 5191069 | Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units | Horst Roeschert, Georg Pawlowski, Ralph R. Dammel | 1993-03-02 |
| 5066567 | Image reversal process utilizing a positive-working photosensitive composition containing a dye | Gerhard Buhr, Ruediger Lenz | 1991-11-19 |
| 4996301 | Polyfunctional .alpha.-diazo-.beta.-keto esters and their use in light-sensitive compositions | Peter Wilharm, Georg Pawlowski | 1991-02-26 |
| 4927732 | Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom | Gerhard Buhr, Ruediger Lenz | 1990-05-22 |
| 4842901 | Coating solution and process for producing glassy layers | Werner Graf | 1989-06-27 |
| 4765844 | Solvents for photoresist removal | Axel Schmitt | 1988-08-23 |
| 4757098 | Stabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymers | Rudolf Klug, Horst Binder | 1988-07-12 |
| 4701300 | Polyamide ester photoresist formulations of enhanced sensitivity | Rudolf Klug, Thomas Herold | 1987-10-20 |
| 4649101 | Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure | Klaus P. Thiel, Raimund Sindlinger | 1987-03-10 |
| 4576903 | Developer for positive photoresists | Winfried Baron, Kurt Marquard, Raimund Sindlinger, Klaus P. Thiel | 1986-03-18 |
| 4540650 | Photoresists suitable for forming relief structures of highly heat-resistant polymers | Rudolf Klug, Hartmut Hartner, Karl-Heinz Neisius | 1985-09-10 |
| 4539288 | Process for the development of relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature | Karlheinz Neisius, Rudolf Klug, Hartmut Hartner | 1985-09-03 |