Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4649101 | Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure | Klaus P. Thiel, Hans-Joachim Merrem | 1987-03-10 |
| 4576903 | Developer for positive photoresists | Winfried Baron, Kurt Marquard, Hans-Joachim Merrem, Klaus P. Thiel | 1986-03-18 |