HF

Hans W. Frass

Hoechst Gmbh: 7 patents #542 of 4,020Top 15%
Overall (All Time): #765,769 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
5378584 Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units Ernst-August Hackmann, Klaus Joerg, Dietmar Koenneke, Rudolf Neubauer, Andreas Elsaesser 1995-01-03
5376496 Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder Andreas Elsaesser, Dieter Mohr 1994-12-27
5368975 Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility Andreas Elsaessser, Otfried Gaschler, Dieter Mohr, Gerhard Buhr 1994-11-29
5292626 Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers Gerhard Buhr, Andreas Elsaesser, Ernst I. Leupold 1994-03-08
5227281 Process for producing negative copies Otfried Gaschler, Andreas Elsaesser, Dieter Mohr 1993-07-13
4990429 Process for the production of negative relief copies utilizing reversal processing Paul Stahlhofen 1991-02-05
4889788 Photosensitive composition, photosensitive copying material prepared from this composition with thermal hardening symmetric triazine alkyl(aryl)-ether Paul Stahlhofen 1989-12-26