Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11698586 | Negative-working ultra thick film photoresist | Hisashi Motobayashi, Lei Lu, Chunwei Chen, PingHung Lu, Weihong Liu | 2023-07-11 |
| 10976662 | Positive working photosensitive material | Weihong Liu, PingHung Lu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai | 2021-04-13 |
| 8841062 | Positive working photosensitive material | Weihong Liu, Ping-Hung Lu, Medhat A. Toukhy, SookMee Lai, Yoshiharu Sakurai | 2014-09-23 |
| 8039202 | Positive-working photoimageable bottom antireflective coating | Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide KATAYAMA +3 more | 2011-10-18 |
| 7824837 | Positive-working photoimageable bottom antireflective coating | Hengpeng Wu, Mark Neisser, Shuji Ding-Lee, Joseph E. Oberlander, Medhat Toukhy | 2010-11-02 |
| 7691556 | Antireflective compositions for photoresists | Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Jianhui Shan, Hong Zhuang | 2010-04-06 |
| 6358665 | Radiation-sensitive composition of chemical amplification type | Georg Pawlowski, Hiroshi Okazaki, Yoshiaki Kinoshita, Naoko Tsugama, Xiao-Ming Ma +1 more | 2002-03-19 |