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Negative-working ultra thick film photoresist |
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Positive working photosensitive material |
Weihong Liu, PingHung Lu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai |
2021-04-13 |
| 8841062 |
Positive working photosensitive material |
Weihong Liu, Ping-Hung Lu, Medhat A. Toukhy, SookMee Lai, Yoshiharu Sakurai |
2014-09-23 |
| 8039202 |
Positive-working photoimageable bottom antireflective coating |
Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide KATAYAMA +3 more |
2011-10-18 |
| 7824837 |
Positive-working photoimageable bottom antireflective coating |
Hengpeng Wu, Mark Neisser, Shuji Ding-Lee, Joseph E. Oberlander, Medhat Toukhy |
2010-11-02 |
| 7691556 |
Antireflective compositions for photoresists |
Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Jianhui Shan, Hong Zhuang |
2010-04-06 |
| 6358665 |
Radiation-sensitive composition of chemical amplification type |
Georg Pawlowski, Hiroshi Okazaki, Yoshiaki Kinoshita, Naoko Tsugama, Xiao-Ming Ma +1 more |
2002-03-19 |
