| 12393115 |
Positive working photosensitive material |
PingHung Lu, Chunwei Chen |
2025-08-19 |
| 12276909 |
Novolak/DNQ based, chemically amplified photoresist |
Medhat A. Toukhy, Takanori Kudo, Hung-Yang Chen, Jian Yin |
2025-04-15 |
| 12058534 |
Method of measuring AAS EMF |
Guoqiang Lu, Edward Mah, Daryl Smith, Dimple Thomas, Guoqiang Xue |
2024-08-06 |
| 11822242 |
DNQ-type photoresist composition including alkali-soluble acrylic resins |
Ping-Hung Lu, Chunwei Chen, Medhat A. Toukhy |
2023-11-21 |
| 11698586 |
Negative-working ultra thick film photoresist |
Aritaka Hishida, Hisashi Motobayashi, Lei Lu, Chunwei Chen, PingHung Lu |
2023-07-11 |
| 11385543 |
Enviromentally stable, thick film, chemically amplified resist |
Medhat A. Toukhy, PingHung Lu |
2022-07-12 |
| 11066805 |
Measuring device and method for horizontal dynamic impedance of specified foundation depth based on differential response analysis of pulse excitation |
Jianbo Li, Zhiyuan Li, Gao LIN |
2021-07-20 |
| 11043001 |
High precision object location in a parking lot |
Tao Zhang |
2021-06-22 |
| 10976662 |
Positive working photosensitive material |
PingHung Lu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida |
2021-04-13 |
| 10773182 |
Multi-stage evaporation system enhanced by a gravity-reduced field |
Xiang Ling, Yang Li, Xin Huang, Tingfen Ke |
2020-09-15 |
| 10705424 |
Negative-working photoresist compositions for laser ablation and use thereof |
Chunwei Chen, Ping-Hung Lu |
2020-07-07 |
| 9252893 |
Methods for determining a beam-forming gain parameter, user equipment, base station, computer programs and computer program products |
Jia Hu, Licong Huang |
2016-02-02 |
| 9012126 |
Positive photosensitive material |
PingHung Lu, Chunwei Chen, Stephen Meyer, Medhat A. Toukhy, SookMee Lai |
2015-04-21 |
| 8906594 |
Negative-working thick film photoresist |
Chunwei Chen, PingHung Lu, Medhat A. Toukhy, Sangchul Kim, SookMee Lai |
2014-12-09 |
| 8841062 |
Positive working photosensitive material |
Ping-Hung Lu, Medhat A. Toukhy, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida |
2014-09-23 |
| 8039201 |
Antireflective coating composition and process thereof |
Huirong Yao, Zhong Xiang, Jian Yin |
2011-10-18 |
