Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11919948 | Isoform-selective anti-TGFβ antibodies and methods of use | Wei-Ching Liang, Joseph R. Arron, Daryle DePianto, Wendy Green Halpern, WeiYu LIN +7 more | 2024-03-05 |
| 11518730 | Polymer compositions for self-assembly applications | Hengpeng Wu, Guanyang Lin | 2022-12-06 |
| 10155879 | Compositions and use thereof for modification of substrate surfaces | Guanyang Lin, Hengpeng Wu, Jihoon Kim, Durairaj BASKARAN, Jianhui Shan | 2018-12-18 |
| 9574104 | Compositions and processes for self-assembly of block copolymers | Jihoon Kim, Hengpeng Wu, Jianhui Shan, Guanyang Lin | 2017-02-21 |
| 9505945 | Silicon containing block copolymers for direct self-assembly application | Hengpeng Wu, Guanyang Lin, Jihoon Kim, Margareta Paunescu | 2016-11-29 |
| 9291909 | Composition comprising a polymeric thermal acid generator and processes thereof | Hengpeng Wu, SungEun Hong, Yi Cao, Margareta Paunescu, Muthiah Thiyagarajan | 2016-03-22 |
| 9181449 | Underlayer composition for promoting self assembly and method of making and using | Yi Yi, Guanyang Lin | 2015-11-10 |
| 9093263 | Underlayer composition for promoting self assembly and method of making and using | Hengpeng Wu, Guanyang Lin, Jihoon Kim, Jianhui Shan | 2015-07-28 |
| 9052598 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Hengpeng Wu, Yi Cao, SungEun Hong, Margareta Paunescu, Mark Neisser +1 more | 2015-06-09 |
| 9040659 | Methods and materials for removing metals in block copolymers | Hengpeng Wu, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao | 2015-05-26 |
| 8852848 | Composition for coating over a photoresist pattern | Hengpeng Wu, Meng Li, Yi Cao, DongKwan Lee, SungEun Hong +1 more | 2014-10-07 |
| 8835581 | Neutral layer polymer composition for directed self assembly and processes thereof | Hengpeng Wu, Orest Polishchuk, Yi Cao, SungEun Hong, Guanyang Lin +2 more | 2014-09-16 |
| 8691925 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Hengpeng Wu, Yi Cao, SungEun Hong, Margareta Paunescu, Mark Neisser +1 more | 2014-04-08 |
| 8686109 | Methods and materials for removing metals in block copolymers | Hengpeng Wu, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao | 2014-04-01 |
| 8329387 | Antireflective coating compositions | Huirong Yao, Guanyang Lin, Hengpeng Wu, Mark Neisser, Ralph R. Dammel | 2012-12-11 |
| 8039201 | Antireflective coating composition and process thereof | Huirong Yao, Zhong Xiang, Weihong Liu | 2011-10-18 |
| 7638262 | Antireflective composition for photoresists | Hengpeng Wu, Zhong Xiang, Hong Zhuang, Jianhui Shan, Huirong Yao +1 more | 2009-12-29 |
| 7553905 | Anti-reflective coatings | David Abdallah, Mark Neisser | 2009-06-30 |